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Target material grain micronization preparation process

A target and grain technology, which is applied in metal material coating process, manufacturing tools, metal rolling, etc., can solve the problems of insufficient size distribution, large target grain size and high production cost, and achieve a concentrated size distribution. , The effect of small target grain size and low production cost

Active Publication Date: 2020-06-23
爱发科电子材料(苏州)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The technical problem to be solved by the present invention is that the grain size of the target material in the prior art is large, and the size distribution is not concentrated enough, and there are technical problems such as complex process and high production cost in the target material manufacturing process.

Method used

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  • Target material grain micronization preparation process
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  • Target material grain micronization preparation process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] A manufacturing process of target crystal grain refinement includes the following steps:

[0037] (1) One-time rolling: Put the aluminum ingot into a heating furnace, set the maximum heating temperature of the furnace body to 250°C, use the temperature probe in the heating furnace to observe the temperature of the aluminum ingot in real time, and when the actual temperature of the aluminum ingot is 170°C, Roll the aluminum ingot once;

[0038] Among them, one rolling is divided into 13 passes, and the reduction of each pass is 20mm. After rolling, cut off the irregular parts of the head and tail of the rolled sheet to obtain a semi-finished target; the thickness of the semi-finished target It is 118mm.

[0039] (2) Secondary calendering: Put the semi-finished target into a heating furnace, set the maximum heating temperature of the furnace body to 380℃, use the temperature probe in the heating furnace to observe the temperature of the semi-finished target in real time, and wa...

Embodiment 2

[0043] The manufacturing process is similar to that of Example 1, except that in the primary rolling step of step (1), when the actual temperature of the aluminum ingot is 220° C., the aluminum ingot is rolled once. The finished target is denoted as S2.

[0044] Calculate the step retention rate in the target manufacturing process, and the final step retention rate=93-95%.

Embodiment 3

[0046] The manufacturing process is similar to that of Example 1, except that in the secondary calendering step of step (2), when the actual temperature of the semi-finished target is 350° C., the semi-finished target is calendered twice. The finished target is denoted as S3.

[0047] Calculate the step retention rate in the target manufacturing process, and the final step retention rate=93-95%.

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Abstract

The invention discloses a target material grain micronization preparation process. The target material grain micronization preparation process comprises the following steps that firstly, an aluminum ingot is heated to 170 DEG C-220 DEG C and then subjected to primary calendaring, the designed calendering pass in the primary calendering process is more than or equal to 2 times, and rolling reduction of each time is equal, and a semi-finished target material is obtained; then the semi-finished target material is heated to 300 DEG C-350 DEG C and then subjected to secondary calendering, the secondary calendering is divided into more than or equal to two passes, the rolling reduction of the first pass is lower than the rolling reduction of the other passes, and a finished target material is obtained. According to the target material grain micronization preparation process, metallographic microscope observation finds that the average size of crystal grains in the finished target material isless than or equal to 90 microns, and the size distribution of the crystal grains is more concentrated.

Description

Technical field [0001] The invention belongs to the technical field of target material preparation, and specifically relates to a process for making target material crystal grains finer. Background technique [0002] In the semiconductor industry, targets can be used to form surface-coated thin film materials through sputtering, ion plating or other coating processes, thereby playing various roles. For aluminum targets, in the preparation process, high-purity aluminum needs to be processed first to produce materials with a certain shape and size, and then through the film forming process, semi-finished materials are prepared for industrial production . [0003] The production process of aluminum target includes: First, the production of high-purity aluminum: Alumina is extracted from bauxite, after electrolysis, smelting and other processes, aluminum materials with a purity of more than 99% are obtained. Second, the deformation treatment of aluminum targets: using high-purity alu...

Claims

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Application Information

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IPC IPC(8): B21B15/00B21B37/00B21B37/74C23C14/34
CPCB21B15/0007B21B37/00B21B37/74C23C14/3414
Inventor 尤小磊常艳超中村晃董常亮
Owner 爱发科电子材料(苏州)有限公司
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