Gas stirring device of chemical vapor deposition furnace
A chemical vapor deposition and gas technology, which is applied in the field of brake disc manufacturing, can solve the problems of reduced reaction rate, waste, and difficult mixing of carbon source gas evenly, so as to achieve the effect of rapid response and improved utilization rate
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[0021] In order to make the purpose, technical solution and advantages of the present invention more clear, the embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined arbitrarily with each other.
[0022] In order to overcome the problem in the prior art that the carbon source gas cannot be mixed quickly and uniformly, the embodiment of the present invention proposes a gas agitation device for a CVD furnace, specifically a device for adjusting the uniformity of the carbon source gas in the chemical vapor deposition furnace. device.
[0023] The following specific embodiments provided by the present invention can be combined with each other, and the same or similar concepts or processes may not be repeated in some embodiments.
[0024] figure 1 A schematic structural d...
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