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Gas stirring device of chemical vapor deposition furnace

A chemical vapor deposition and gas technology, which is applied in the field of brake disc manufacturing, can solve the problems of reduced reaction rate, waste, and difficult mixing of carbon source gas evenly, so as to achieve the effect of rapid response and improved utilization rate

Inactive Publication Date: 2020-06-23
XIAN AVIATION BRAKE TECH
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  • Abstract
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Problems solved by technology

[0004] In order to solve the above-mentioned technical problems, an embodiment of the present invention provides a gas agitation device for a chemical vapor deposition furnace to solve the problem that in the existing process of manufacturing carbon brake discs, it is difficult to quickly mix the carbon source gas passed into the CVD furnace evenly, and the As a result, the carbon source gas in the CVD furnace cannot fully react, resulting in a decrease in the reaction rate, and the problem of waste due to insufficient reaction of the raw material gas

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  • Gas stirring device of chemical vapor deposition furnace
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Embodiment Construction

[0021] In order to make the purpose, technical solution and advantages of the present invention more clear, the embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined arbitrarily with each other.

[0022] In order to overcome the problem in the prior art that the carbon source gas cannot be mixed quickly and uniformly, the embodiment of the present invention proposes a gas agitation device for a CVD furnace, specifically a device for adjusting the uniformity of the carbon source gas in the chemical vapor deposition furnace. device.

[0023] The following specific embodiments provided by the present invention can be combined with each other, and the same or similar concepts or processes may not be repeated in some embodiments.

[0024] figure 1 A schematic structural d...

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Abstract

An embodiment of the invention discloses a gas stirring device of a chemical vapor deposition furnace. The gas stirring device comprises a gas mixing tank and a stirring assembly arranged in the gas mixing tank, wherein a gas inlet is formed in one end face of the gas mixing tank, and the other end face of the gas mixing tank communicates with a chemical vapor deposition (CVD) furnace body; and the stirring assembly comprises a shaft body and at least three blades evenly arranged in the circumferential direction of the shaft body, two ends of the shaft body are fixedly arranged at two ends ofthe gas mixing tank in a one-to-one correspondence mode, and a preset included angle is formed between each blade and the vertical face of the shaft body. According to the gas stirring device of the chemical vapor deposition furnace, the problems that in an existing carbon brake disc manufacturing process, due to the fact that carbon source gases introduced into the CVD furnace are difficult to mix rapidly and evenly, the carbon source gases in the CVD furnace cannot react sufficiently, the reaction rate is decreased, raw material gases react insufficiently, and waste is caused are solved.

Description

technical field [0001] The present application relates to but not limited to the technical field of brake disc manufacturing, especially a gas agitation device for a chemical vapor deposition furnace. Background technique [0002] The manufacturing process of the carbon brake disc is to stack the carbon fiber prefabricated body in a chemical vapor deposition (Chemical Vapor Deposition, referred to as: CVD) furnace, heat it to the required temperature, and pass different types of carbon source gas or Inert gas mixture, such as hydrocarbons, nitrogen, etc., the carbon source gas is heated to a certain temperature to crack and diffuse into the porous preform, and part of the pyrolytic carbon is deposited around the carbon fibers and in the gaps to make the preform dense. After the density meets the requirements , and finally form a carbon brake disc. [0003] Since the carbon source gas for the CVD process may be a mixed gas, and the density of the carbon source gas with diffe...

Claims

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Application Information

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IPC IPC(8): C23C16/455C23C16/26
CPCC23C16/26C23C16/45512
Inventor 李培元杨睿欣杜淑娣薛亮
Owner XIAN AVIATION BRAKE TECH