Photosensitive composition and application thereof

Abstract

The invention relates to a photosensitive composition and application thereof. The photosensitive composition comprises a free radical scavenger, a monomer, a photoinitiator, alkali-soluble resin anda pigment, wherein the mass of the free radical scavenger accounts for 0.01-0.8 wt.% of the total mass of the monomer and the alkali-soluble resin; the photosensitive composition is used for a color filter. According to the invention, the free radical scavenger accounting for 0.01-0.8 wt.% of the total mass of the monomer and the alkali-soluble resin is added into the photosensitive composition; according to the photosensitive composition disclosed by the invention, a plurality of free radicals generated between pre-baking and exposure are reacted, so the dark reaction is weakened, the line width of a product is still stable even if the product is placed for a long time, the yield of the product is improved, and the photosensitive composition has good process tolerance.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display, in particular to a photosensitive composition and its application. Background technique [0002] The preparation method of the color filter is to coat the color photoresist composition on the treated glass substrate to form a coating film or color gel film with a certain thickness, then pre-bake, and then use a mask plate to irradiate with ultraviolet light. Exposure to a specific part of the color film, the exposed area is due to the photoinitiator-induced cross-linking polymerization of the monomer to form a polymer network structure, which is retained in the subsequent alkali solution development, and the retained pattern is developed, cleaned, and heated at high temperature. After baking, the color filter is obtained, and the non-exposed area is washed away by lye, which includes several steps of substrate treatment, gluing, pre-baking, exposure, development, and post-baking. ...

AI Technical Summary

Problems solved by technology

[0003] After the color photoresist is coated and pre-baked, some free radicals will appear. However, in the production process, node quality inspections will be performed irregularly or downtime will occur. If the time between pre-baking and exposure is too long Long (greater than 0.5h), the influence of dark reaction on the line width of the product is very obvious, making the development more difficult

And with the increase of time, the line width increases significantly, seriously affecting the yield of the product

[0004] CN108535961A discloses a kind of color photoresist composition, described color photoresist composition comprises pigment dispersion liquid, alkali-soluble resin, monomer, photoinitiator, solvent and additive; Described pigment dispersion liquid comprises dispersant, Dispersion resin and pigment, the pigment is connected with the dispersion resin, and the pigment in the pigment dispersion liquid is uniformly dispersed in the photoresist composition; in the post-baking stage of the color filter, the dispersion resin is heated Carboxyl groups are generated under certain conditions, so that the carboxyl groups chemically react with the alkali-soluble resin in the color photoresist or / and the epoxy group in the monomer, so that the pigment is fixed in the resin in the color photoresist composition On the cross-linked network to improve the agglomeration of pigments and improve the quality of color filters, but if the time between pre-baking and exposure is too long, the dark reaction will increase the line width of the product and reduce the yield of the product

Likewise, the patent does not mention how to prevent the occurrence of dark reactions when the time between pre-bake and exposure is too long

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