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Aerosol conveying assistant device and conveying method

An auxiliary device, aerosol technology, applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problems of polluted pipeline, atmospheric pressure difference, liquid aerosol input control, etc., to achieve the effect of convenient cleaning

Active Publication Date: 2020-07-03
NANCHANG HANGKONG UNIVERSITY
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, when the liquid aerosol enters the reaction chamber to form a thin film, there are still two main technical problems that have not been effectively solved due to the large air pressure difference between the reaction chamber and the atomization generator: one is that the atomization source is continuous and stable. The problem of ground output; the second is the problem of liquid aerosol input control
In addition, liquid aerosols can contaminate pipelines

Method used

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  • Aerosol conveying assistant device and conveying method
  • Aerosol conveying assistant device and conveying method

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Embodiment Construction

[0029] Below in conjunction with accompanying drawing and embodiment the present invention will be further described:

[0030] Such as figure 1 and figure 2 As shown, an aerosol transmission auxiliary device and delivery method include an atomization generator 1 , a mixing buffer chamber 4 and a cross-shaped pipe joint 6 . Among them, it should be noted that: in the field of material preparation, the atomization generator 1 is generally a device that generates liquid aerosol based on ultrasonic atomization, and the atomization amount is related to the composition, concentration, temperature and air pressure of the solution. There is a relationship, and usually a stable atomization is achieved at normal pressure.

[0031] Between the atomization generator 1 and the mixing buffer chamber 4, at least two aerosol transmission branch pipelines with the same structure are arranged in parallel. It should be noted that in this case, only two aerosol transmission branch lines with ...

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Abstract

The invention discloses an aerosol conveying assistant device and a conveying method. The aerosol conveying assistant device comprises an atomization generator, a mixing buffering chamber and a cross-shaped pipeline joint; at least two aerosol conveying branch pipes which are the same in structure are disposed between the atomization generator and the mixing buffering chamber in a parallel connection mode; each aerosol conveying branch pipe is in series connection with two electrically-operated valves and one buffering chamber, wherein the buffering chamber is located between the two electrically-operated valves, the two electrically-operated valves are opened and closed alternately, and an adjustable valve is connected to a control end of the buffering chamber and delivers outside gas into the buffering chamber; a collecting bottle is connected to the mixing buffering chamber, an inlet of the cross-shaped pipeline joint communicates with an outlet of the mixing buffering chamber; andelectrically-operated valves are disposed at three outlets of the cross-shaped pipeline joint correspondingly. Through the aerosol conveying assistant device, a thin film can be formed at high speed through liquid aerosol.

Description

technical field [0001] The invention belongs to the technical field of preparation of new materials, in particular to the preparation of film materials, and in particular relates to an aerosol transmission auxiliary device and a delivery method. Background technique [0002] Thin film materials have broad application fields, and related research work has been a hot spot in material science in the past 30 years. The preparation of thin film materials is the first step in research and application, so new preparation methods and equipment are constantly emerging. In general, the preparation methods of thin film materials are all pursuing high quality, high speed, low energy consumption, and low pollution emissions. However, most of the current mainstream preparation methods require the support of a vacuum environment, such as molecular beam epitaxy, sputtering, and chemical vapor deposition. Usually gaseous raw materials are input into the reaction chamber through pipelines, ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/448C23C16/455C23C16/54
CPCC23C16/4486C23C16/455C23C16/54
Inventor 朱泉水
Owner NANCHANG HANGKONG UNIVERSITY
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