Mask plate and preparation method
A mask and substrate technology, used in semiconductor/solid-state device manufacturing, vacuum evaporation plating, coating, etc., can solve problems such as easy displacement and deformation, avoid position shift, improve production yield, ensure The effect of alignment accuracy
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[0042] In order to make the objectives, technical solutions and advantages of the present invention clearer, the embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be noted that, the embodiments in the present application and the features in the embodiments may be arbitrarily combined with each other if there is no conflict.
[0043] figure 1 is a structure diagram of a mask, figure 2 for figure 1 A schematic diagram of the structure of the alignment of the mask plate and the substrate is shown. like figure 1 As shown, the mask 1 includes a frame (Frame) 10, alignment strips (AlignMask) 11 disposed on both sides of the first surface 10a of the frame 10, a support frame (Full Mask) 12 disposed on the frame 10, and disposed on the The first surface 10a of the frame 10 is overlapped with a fine metal mask (Fine Metal Mask, FMM) 13 on the support frame 12, and the first surface 10a is the surface of th...
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