Cleaning tank structure on semiconductor silicon wafer cleaning machine

A silicon wafer cleaning and cleaning tank technology, which is used in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of high consumption of pure water and increased consumption of pure water, and achieve the effect of saving water and energy and reducing consumption.

Inactive Publication Date: 2020-08-25
杭州易正科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The existing specific cleaning method is to place the silicon chip on the material frame carrying the silicon chip, soak the material frame carrying the silicon chip into the liquid medicine tank, then lift the material frame, drain the water, and then put the material frame into pure water Soaking and cl

Method used

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  • Cleaning tank structure on semiconductor silicon wafer cleaning machine
  • Cleaning tank structure on semiconductor silicon wafer cleaning machine
  • Cleaning tank structure on semiconductor silicon wafer cleaning machine

Examples

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Example Embodiment

[0024] Example: see Figure 1 to 6 As shown, a cleaning tank structure on a semiconductor silicon wafer cleaning machine includes a cleaning table 1 on the cleaning machine. The cleaning table 1 is inserted and fixed with a chemical tank 2 and a pure water tank 3, and the chemical tank 2 and the pure water tank 3 are both A silicon wafer supporting bracket 4 is inserted. The silicon wafer supporting bracket 4 includes a rectangular frame body 41. A number of opposed slots 411 are formed on the inner walls of the upper front and rear sides of the frame body 41. The inner wall of the side is formed with a slot connected to the slot 411 and passing through the lower end surface of the frame 41. The outer walls of the frame 41 on both sides of the slot are formed with inlet and outlet slots 412. The upper and lower bottom surfaces of the inlet and outlet slots 412 A number of opposing positioning grooves 413 are formed. A number of horizontal support rods 42 are inserted into the p...

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PUM

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Abstract

The invention discloses a cleaning tank structure on a semiconductor silicon wafer cleaning machine. The cleaning tank structure comprises a cleaning table on the cleaning machine; a liquid medicine tank and a pure water tank are inserted and fixed on the cleaning table; silicon wafer bearing supports are inserted into the liquid medicine tank and the pure water tank; and each the silicon wafer bearing support comprises a frame body. A plurality of opposite slots are formed in the inner walls of the front side and the rear side of the upper part of the frame body; cutting grooves are formed inthe inner walls of the front side and the rear side of the lower part of the frame body; inlet and outlet notches are formed in the outer walls of the frame body on two sides of the cutting grooves;a plurality of opposite positioning grooves are formed in the upper bottom face and the lower bottom face of the inlet and outlet notches; supporting rods are inserted into the positioning grooves inthe upper side of the inlet and outlet notches; the right end of each supporting rod extends out of the frame body and is fixed to a connecting strip; an extension rod is fixed to the connecting strip; the upper end of the extension rod is fixedly connected with a piston rod of a supporting air cylinder; the supporting air cylinder is fixed to a supporting support; and the supporting support is fixed to the frame body.

Description

technical field [0001] The invention relates to the technical field of semiconductor cleaning machines, in particular to a structure of a cleaning tank on a semiconductor silicon wafer cleaning machine. Background technique [0002] Integrated circuit chips made of silicon wafers are conventional semiconductor products, and silicon wafers need to be cleaned before making integrated circuit chips. The existing silicon chip cleaning is first put into the chemical solution tank for surface chemical treatment, and then sent into the cleaning tank (using pure water for cleaning, also called pure water tank) to clean up the chemical solution adhered to the surface. The existing specific cleaning method is to place the silicon chip on the material frame carrying the silicon chip, soak the material frame carrying the silicon chip into the liquid medicine tank, then lift the material frame, drain the water, and then put the material frame into pure water Soaking and cleaning in the ...

Claims

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Application Information

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IPC IPC(8): H01L21/673H01L21/67
CPCH01L21/67057H01L21/67323
Inventor 徐俊
Owner 杭州易正科技有限公司
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