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A wafer inspection equipment

A technology for testing equipment and wafers, applied in measurement devices, cleaning methods using gas flow, instruments, etc., can solve problems such as inability to remove foreign objects well, false detection in other areas, and foreign objects scattered.

Active Publication Date: 2022-07-22
SKYVERSE TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, after the foreign matter is blown away, it may be scattered to other areas of the photo-inspection sample, thereby causing false detection in other areas. foreign body

Method used

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  • A wafer inspection equipment
  • A wafer inspection equipment
  • A wafer inspection equipment

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Embodiment Construction

[0047] In order to make those skilled in the art better understand the technical solutions of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0048] Please refer to Figure 2-8 , figure 2 The connection structure diagram of the base station and the light source, the purging component, the nozzle, the windshield and the suction nozzle in the detection equipment provided by the present invention, image 3 for figure 2 A schematic diagram of the structure from another perspective, Figure 4 for figure 2 bottom view, Figure 5 for detecting components with figure 2 The relative position diagram of the structure in , Image 6 Schematic diagram of the structure of the windshield, Figure 7 for Image 6 Sectional view of the divider, Figure 8 It is the connection structure diagram of the abutment, the purging parts and the nozzle.

[0049] like Figure 2-5 As...

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Abstract

The invention discloses a cleaning device and detection equipment, wherein the cleaning device comprises a purging component and a suction component, the purging component is used for spraying a purging gas to a to-be-processed area of ​​the sample, and the suction component An assembly is used to provide suction to the purge gas that is swept across the area to be treated. When in use, the purging component and the aspirating component can start to work at the same time, and the air outlet of the purging component can blow out the purging gas to purge the area to be processed of the sample; in the direction of the airflow, the aspirating component is located at the On the downstream side of the processing area, suction can be provided for the purged gas to collect this part of the gas, which can largely prevent the purged purge gas that may carry foreign matter such as dust and contaminate other parts of the sample. situation.

Description

technical field [0001] The present invention relates to the technical field of cleaning devices, in particular to a cleaning device and detection equipment. Background technique [0002] Optical inspection has the characteristics of high sensitivity, high precision and non-contact, and occupies an increasingly important position in industries such as semiconductor process inspection. Specifically, optical inspection uses a light source to illuminate the surface of a photodetected sample (such as a wafer), and captures the features of the photodetected sample through an industrial camera to generate image information, and then transmits the image information to an image processing system to realize optical detection. Automatic identification of sample characteristics. [0003] Please refer to figure 1 , figure 1 It is a schematic structural diagram of a specific embodiment of a gas purging device in the prior art. [0004] In order to reduce the false detection that may b...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B5/02B08B11/00G01N21/01
CPCB08B5/02B08B11/00G01N21/01
Inventor 陈鲁李海卫
Owner SKYVERSE TECH CO LTD