A method for roughening the surface of aluminum nitride ceramic substrate
An aluminum nitride ceramic and substrate surface technology, applied in the field of surface treatment of ceramic substrates, can solve problems such as poor bonding between the substrate and the solder layer, and achieve the effect of solving poor bonding and enhancing bonding
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specific Embodiment 1
[0042] Concrete embodiment 1 compares with the test result of comparative example 1:
[0043] 1) Ultrasonic flaw detector test:
[0044] Ultrasonic flaw detectors analyzed the aluminum nitride ceramic substrates in Example 1 and Comparative Example 1 respectively, and the results showed that Example 1 had fewer cracks and voids in the solder bonding layer than Comparative Example 1. see results figure 2 . A2 and B2 are the result diagrams obtained by ultrasonic flaw detector on two randomly selected aluminum nitride ceramic substrates in the manner of specific embodiment 1. A1 and B1 are results obtained by using the method of Comparative Example 1, and two aluminum nitride ceramic substrates randomly selected by an ultrasonic flaw detector.
[0045] 2) Copper porcelain peel strength test:
[0046] Table 1 Surface roughness and copper porcelain peel strength test results
[0047]
[0048] The copper-ceramic peel strength test in specific example 1 and comparative exam...
specific Embodiment 2
[0050] Specific embodiment 2, a method for roughening the surface of an aluminum nitride ceramic substrate, comprising the following steps:
[0051] Step 1, using degreasing agent and pure water to remove oil and impurities on the surface of the aluminum nitride ceramic substrate, and testing the surface roughness of the aluminum nitride ceramic substrate, the initial surface roughness is 0.2-0.25;
[0052] Step 2, immersing the aluminum nitride ceramic substrate treated in step 1 in NaOH solution with a mass fraction of 15%-20%, and ultrasonicating at 50°C for 2-3min;
[0053] Step three, place the aluminum nitride ceramic substrate treated in step two in 1%-3% dilute H 2 SO 4 In the solution, the treatment is 5s-10s, and the temperature is controlled at 15°C-25°C;
[0054] Step 4, wash the aluminum nitride ceramic substrate treated in step 3 with water under pressure at room temperature for 3 minutes;
[0055] Step five, drying the aluminum nitride ceramic substrate treat...
specific Embodiment 3
[0059] Specific embodiment 3, a method for roughening the surface of an aluminum nitride ceramic substrate, comprising the following steps:
[0060] Step 1, remove oil and impurities on the surface of the aluminum nitride ceramic substrate by degreasing agent and pure water, and test the surface roughness of the aluminum nitride ceramic substrate, the initial surface roughness is 0.25-0.3;
[0061] Step 2, immersing the aluminum nitride ceramic substrate treated in step 1 in NaOH solution with a mass fraction of 15%-20%, and ultrasonicating at 50°C for 1-2min;
[0062] Step three, place the aluminum nitride ceramic substrate treated in step two in 1%-3% dilute H 2 SO 4 In the solution, the treatment is 5s-10s, and the temperature is controlled at 15°C-25°C;
[0063] Step 4, wash the aluminum nitride ceramic substrate treated in step 3 with water under pressure at room temperature for 3 minutes;
[0064] Step five, drying the aluminum nitride ceramic substrate treated in ste...
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