Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A Displacement Measuring Device and Method Based on Electromagnetically Induced Transparent Atom Grating

An electromagnetically induced transparency and displacement measurement technology, applied to measuring devices, optical devices, instruments, etc., can solve problems such as cost increase, repeated adjustment system complexity, measurement errors, etc., achieve high displacement measurement accuracy, and reduce production process requirements , the effect of low integration difficulty

Active Publication Date: 2021-05-14
SHANXI UNIV
View PDF12 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

First of all, there are inevitably defects in the traditional grating production, which will lead to measurement errors; moreover, there is a singleness in the use of physical gratings, a single-made grating can only be used in one application scenario, and changes in measurement requirements can only be made through replacement, which will increase the cost and the complexity of the repeated adjustment system

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A Displacement Measuring Device and Method Based on Electromagnetically Induced Transparent Atom Grating
  • A Displacement Measuring Device and Method Based on Electromagnetically Induced Transparent Atom Grating
  • A Displacement Measuring Device and Method Based on Electromagnetically Induced Transparent Atom Grating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0039] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are part of the embodiments of the present invention, rather than All the embodiments; based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts all belong to the protection scope of the present invention.

[0040] like figure 1 As shown, the embodiment of the present invention provides a displacement measurement device based on an electromagnetically induced transparent atomic grating, including a coupling laser source 1, a detection laser source 2, an offset frequency-locked optical path 3, an electromagnetically induced frequency-locked optical path 4, and a reference interference optical path 5. Measure th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the technical field of precision displacement measurement, and provides a displacement measurement system based on an electromagnetically induced transparent atomic grating, including a coupled laser source, a detection laser source, an offset frequency-locked optical path, an electromagnetically induced frequency-locked optical path, a reference interference optical path, and a measuring Interference optical path and photoelectric detection optical path; the present invention builds the corresponding standing wave field structure through the interference optical path, periodically modifies the refractive index in the atomic medium under the mechanism of electromagnetic induction transparency, and constructs an atomic grating with adjustable grating pitch. The channel photodetector is used for detection, and the displacement measurement through the atomic grating is realized, which improves the measurement accuracy. Moreover, the present invention breaks through the limitation that the pitch of the grating cannot be adjusted, and can reasonably set the pitch according to the different displacement degrees of the object to be measured, so as to realize a grating displacement measurement system with adjustable minimum displacement resolution, thereby adapting to various environments. Displacement measurement needs.

Description

technical field [0001] The invention belongs to the technical field of precision displacement measurement, and in particular relates to a displacement measurement device and method based on an electromagnetically induced transparent atomic grating. Background technique [0002] The grating displacement measurement technology first used the Moiré fringe phenomenon formed by the grating overlap to realize the precise measurement of displacement, but the grating based on this measurement principle is only suitable for occasions that do not require high precision. Later, with the development of grating displacement measurement technology based on the principle of interferometry, the accuracy of grating displacement measurement has been improved to the nanometer level, and it has been applied in cutting-edge equipment such as lithography machines. However, the traditional grating displacement measurement technology is mainly based on the physical grating. The grating manufacturin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/02
CPCG01B11/02
Inventor 元晋鹏汪丽蓉董世超
Owner SHANXI UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products