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Improved photoresist homogenizing method for surface of optical glass

A technology for optical glass and photoresist, which is applied to devices for coating liquids on surfaces, pretreatment surfaces, coating equipment for photoengraving processes, etc. Good uniformity and reduced waste

Pending Publication Date: 2020-12-01
JIANGSU SINA OPTICAL INSTR CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Film thickness has an important influence on the effect of photolithography, but the film thickness uniformity formed by this traditional process is extremely poor

Method used

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  • Improved photoresist homogenizing method for surface of optical glass

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] A kind of improved glue-leveling method for the surface of optical glass comprises the following steps:

[0023] Step 1: Place the substrate on the rotating head of the coating table, rotate the substrate at a low speed, drop the photoresist onto the substrate, and spread the photoresist on the substrate;

[0024] Step 2: increasing the rotation speed of the substrate in step 1, so that the substrate rotates at a high speed, and the photoresist becomes thinner on the substrate;

[0025] Step 3: Exhaust and dry the substrate rotating at high speed in step 2, remove excess solvent in the adhesive layer and exhaust solvent vapor, and at the same time heat the substrate to thoroughly dry and cure the photoresist.

[0026] The rotation speed of the substrate in step one is 450rpm.

[0027] In the second step, the rotation speed of the substrate is 2000rpm, and the rotation time is 100s.

Embodiment 2

[0029] A kind of improved glue-leveling method for the surface of optical glass comprises the following steps:

[0030] Step 1: Place the substrate on the rotating head of the coating table, rotate the substrate at a low speed, drop the photoresist onto the substrate, and spread the photoresist on the substrate;

[0031] Step 2: increasing the rotation speed of the substrate in step 1, so that the substrate rotates at a high speed, and the photoresist becomes thinner on the substrate;

[0032] Step 3: Exhaust and dry the substrate rotating at high speed in step 2, remove excess solvent in the adhesive layer and exhaust solvent vapor, and at the same time heat the substrate to thoroughly dry and cure the photoresist.

[0033] The rotation speed of the substrate in step one is 480rpm.

[0034] In step 2, the rotation speed of the substrate is 4000rpm, and the rotation time is 200s.

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Abstract

The invention belongs to the technical field of semiconductor processes, and particularly relates to an improved photoresist uniformizing method for the surface of optical glass. The method comprisesthe following steps of: 1, placing a substrate on a photoresist uniformizing table rotating head, rotating the substrate at a low speed, dripping a photoresist on the substrate, and spreading the photoresist on the substrate; 2, increasing the rotating speed of the substrate in the step 1, so that the substrate rotates at a high speed, and the photoresist is thinned on the substrate; and 3, carrying out air exhaust drying on the substrate rotating at the high speed in the step 2 to remove the redundant solvent in the adhesive layer and exhaust solvent vapor completely. According to the method,the film thickness uniformity is improved, and the photoetching effect is further improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor technology, and in particular relates to an improved glue leveling method for the surface of optical glass. Background technique [0002] In the field of semiconductor processing technology, photolithography technology is an indispensable processing link. The traditional photolithography process includes three main steps of coating, exposure and development. [0003] Film thickness has an important influence on the effect of photolithography, but the uniformity of film thickness formed by this traditional process is extremely poor. Therefore, the present invention provides an improved glue leveling method for the surface of optical glass, which improves the uniformity of film thickness, and further improves the effect of photolithography. Contents of the invention [0004] Aiming at the deficiencies in the prior art, the invention provides an improved glue leveling method for the surface...

Claims

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Application Information

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IPC IPC(8): G03F7/16B05D1/00B05D3/04
CPCG03F7/16B05D1/005B05D3/0413
Inventor 张威周常河刘年生丁自强由玉兴马帅
Owner JIANGSU SINA OPTICAL INSTR CO LTD