A kind of low dielectric unsaturated benzoxazine resin composition and preparation method
A resin composition and benzoxazine technology are applied in the field of low-dielectric unsaturated benzoxazine resin compositions and preparations, and can solve the problems of low crosslinking density, high brittleness, insufficient dielectric properties, etc. High transition temperature, high mechanical properties, and the effect of increasing crosslinking density
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Embodiment 1
[0024] Preparation method of low dielectric unsaturated benzoxazine resin composition:
[0025] (1) Thimmer 134 g of allyl phenol is added to dry three flasks, warmed to 40 ° C, slowly drop 200 g vinyl osmethililine into the system, and then heat up the system to 50 ° C for 2 hours after the drop is added. The temperature is reduced to room temperature;
[0026] (2) Take 65 g of polymethylene formaldehyde to the product of step (1), slowly warming up to 50 ° C, the treatment system is no longer warming to react to 100 ° C for 2 hours, and the system temperature is reduced to 80 ° C vacuum removal system The water and small molecule impurities can be obtained by an unsaturated group of benzoxazine resins;
[0027] (3) 50 g of tri-cyananate, 5g isopropyl hydrogen peroxide initiator, 0.25 g of naphthoquinone mixed-polymer initiators, and 0.25 g of naphthoquinone mixed-polymer initiating agent Unsaturated benzoxazine resin composition.
[0028] The viscosity of the resulting product (...
Embodiment 2
[0030] Preparation method of low dielectric unsaturated benzoxazine resin composition:
[0031] (1) Thrombin is added to the dry three flask, and the temperature is raised to 30 ° C, and the 54 g of allylamine is slowly dropped into the system. After the dropping is added, the system is warmed to 40 ° C for 2 hours, and then the system will be systematically Temperature falls to room temperature;
[0032] (2) Extension 62 g of polymethylene formaldehyde is added to the product of step (1), slowly warming up to 50 ° C, the treatment system is no longer warming to react to 90 ° C for 2 hours, and the system temperature is reduced to 80 ° C to remove the system The water and small molecule impurities can be obtained by an unsaturated group of benzoxazine resins;
[0033] (3) 40 g of tri-cyanate, 4.5 g of isopropyl hydrogen peroxide initiator, 0.25 g of phenyl dioxide, 0.25 g of naphthoquinone mixed polymerization agent A low dielectric unsaturated benzoxazine resin composition can be...
Embodiment 3
[0036] Preparation method of low dielectric unsaturated benzoxazine resin composition:
[0037] (1) Take 156 g of methoxyethylphenol to the dry three flask, warmed to 30 ° C, slowly drop 120 g of ethynyl aniline into the system, and the system was tapered to 40 ° C for 2 hours after the dropwise addition. Then reduce the temperature temperature to room temperature;
[0038] (2) Welder 60 g of polymethoxaldehyde is added to the product of step (1), slowly warming up to 40 ° C, the treatment system is no longer warming to react to 100 ° C for 2 hours, and the system temperature is reduced to 80 ° C vacuum removal system The water and small molecule impurities can be obtained by an unsaturated group of benzoxazine resins;
[0039] (3) 50 g of an alpha-methylstyrene, 5 g of isopropylstylene hydrogen peroxide initiator, 0.25 g of a phenol-added agent, and 0.25 g of a phenol-added agent, and a low dielectric unsaturated is obtained. Benzoxazine resin composition.
[0040] The viscosity ...
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