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Ultrahigh-pressure cleaning device

An ultra-high pressure and pressure technology, applied in cleaning methods and utensils, chemical instruments and methods, and cleaning methods using liquids, etc., can solve problems such as inability to effectively improve product yield, improve product cleaning effect, and reduce dissolution. , the effect of improving the removal rate

Active Publication Date: 2020-12-18
SUZHOU KZONE EQUIP TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the prior art, for small particle size particles, the cleaning methods generally adopt two-fluid, MS, etc., but with the upgrading of flat panel display products, the requirements for its manufacturing process are higher, and smaller particle size particles need to be removed. The original technology cannot effectively improve the product yield

Method used

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Embodiment Construction

[0037] The technical solutions of the present invention will be clearly and completely described below in conjunction with the accompanying drawings. Apparently, the described embodiments are some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0038] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, ...

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Abstract

The invention relates to an ultrahigh-pressure cleaning device. The cleaning device comprises a supply pipe, a gas-liquid membrane pipe, a plunger pump, a filtering tank and a discharging pipe; the two ends of the gas-liquid membrane pipe are connected with different parts of the supply pipe; the gas-liquid membrane pipe is further provided with a ventilation end; the ventilation end is connectedwith a carbon dioxide access pipe; the plunger pump is connected to an outlet of the supply pipe; the plunger pump is driven by a motor; the filtering tank is connected to an outlet of the plunger pump; and the discharging pipe is connected with a liquid outlet of the filtering tank. A cleaning liquid is atomized under ultrahigh pressure after being pressurized by the plunger pump and filtered bythe filtering tank, so that liquid molecules are refined, the removal rate of small-particle-size particles is increased, and the product cleaning effect is improved. Carbon dioxide is dissolved in the cleaning liquid through the gas-liquid membrane pipe; and the carbon dioxide is dissolved in the cleaning liquid, and dissociated hydrogen ions and bicarbonate ions suppress static electricity in the cleaning liquid, so that partial dissolution, caused by static current, of metal wires or thin films on the surface of a substrate is reduced.

Description

technical field [0001] The invention belongs to the flat panel display industry and relates to a cleaning device, in particular to an ultra-high pressure cleaning device for cleaning the surface of a glass substrate. Background technique [0002] In the prior art, for small particle size particles, the cleaning methods generally adopt two-fluid, MS, etc., but with the upgrading of flat panel display products, the requirements for its manufacturing process are higher, and smaller particle size particles need to be removed. The original technology cannot effectively improve the product yield. Contents of the invention [0003] The purpose of the present invention is to provide an ultra-high pressure cleaning device, which can remove particles with smaller particle diameters on the surface of the object to be cleaned. [0004] In order to achieve the above object, the technical scheme adopted in the present invention is: [0005] The invention provides an ultra-high pressur...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/02B08B3/14B08B3/10
CPCB08B3/02B08B3/14B08B3/10
Inventor 蒋新陈宽政陈国才
Owner SUZHOU KZONE EQUIP TECH