Method for protecting seed crystal layer during production of cast single crystal

A seed crystal layer and single crystal technology is applied in the field of protection of the seed crystal layer during the production of cast single crystals, which can solve the problems affecting the quality of cast single crystals, easy nucleation, etc., so as to reduce the probability of nucleation and growth, and reduce the number of nuclei. crystal, the effect of reducing the probability of dislocation

Inactive Publication Date: 2020-12-18
尹翠哲 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the direct contact between the seed crystal layer and the silicon material, silicon powder and small silicon particles are easy to fall into the joints between the seed crystals, and the silicon powder and small silicon particles are easy to nucleate, and polyc

Method used

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  • Method for protecting seed crystal layer during production of cast single crystal
  • Method for protecting seed crystal layer during production of cast single crystal
  • Method for protecting seed crystal layer during production of cast single crystal

Examples

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Example Embodiment

[0034]Specific Example 2

[0035]Referencefigure 2 When producing cast single crystals, a method for protecting the seed layer is provided, which includes the following steps:

[0036]Step a: Prepare a protective plate, the size of the protective plate is 950mm×950mm×20mm, which matches the size of the G6 crucible, and the material of the protective plate is silicon material.

[0037]Step b: Prepare a small rectangular parallelepiped shape support leg, the size of the support leg is 30mm×30mm×10mm, and the material of the support leg is silicon material.

[0038]Step c: Pull the single crystal rod to remove the edge skin, and then cut to obtain a cuboid-shaped seed crystal, the size of the seed crystal is 158mm×158mm×20mm.

[0039]Step d: Lay the seed crystal on the bottom of the crucible to form a complete seed crystal layer.

[0040]Step e: Place the small rectangular parallelepiped support legs around the seed crystal layer, only four corners of the seed crystals are subjected to compressive stres...

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Abstract

The invention discloses a method for protecting a seed crystal layer during the production of cast single crystal, which comprises the following steps of: pulling a single crystal rod straightly to remove an edge skin, cutting to obtain a cuboid seed crystal, and laying the seed crystal at the bottom of a crucible; and placing prepared supporting legs and a protection plate at the bottom of the crucible, leaving a certain gap between the seed crystal layer and the protection plate, placing a primary polycrystalline silicon material, head and tail edges and other circulating materials on the protection plate, and obtaining a cast monocrystalline silicon ingot by adopting a semi-melting process. According to the invention, silicon powder or small silicon particles can be prevented from falling into a splicing seam between seed crystals during silicon material loading, and the probability of polycrystal generation in a cast single crystal ingot can be reduced; and a certain gap is reserved between the protection plate and the seed crystal layer, and the silicon material is not directly pressed on the seed crystal layer, so that the probability of dislocation caused by pressure stresscan be reduced, and the quality of the cast monocrystalline silicon ingot is improved.

Description

technical field [0001] The invention relates to the field of photovoltaic manufacturing, in particular to a method for protecting a seed crystal layer when producing cast single crystals. Background technique [0002] At present, the general steps of producing cast single crystal are as follows: Lay a layer of single crystal seed crystal on the bottom of the crucible, install the head material, tail material, side skin and primary polysilicon material of the normal ingot on the single crystal seed crystal, and use the semi-melting process to obtain Cast single crystal. Due to the direct contact between the seed crystal layer and the silicon material, silicon powder and small silicon particles are easy to fall into the joints between the seed crystals, and the silicon powder and small silicon particles are easy to nucleate, and polycrystals grow between the seed crystals; Directly pressed on the seed crystal layer, the seed crystal bears a large compressive stress, which lea...

Claims

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Application Information

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IPC IPC(8): C30B29/06C30B11/00
CPCC30B11/00C30B29/06
Inventor 尹翠哲王小兵
Owner 尹翠哲
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