Preparation method of microstructure with constant aspect ratio and PDMS elastomer
A microstructure and aspect ratio technology, applied in microstructure technology, microstructure devices, manufacturing microstructure devices, etc., can solve the problem of high preparation cost of small batch test products, difficult to process arc-shaped microstructures, and time-consuming microstructure processing. and other problems, to achieve the effect of easy operation, good practicability, and conducive to popularization and application.
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[0036] It should be noted that, in the case of no conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other.
[0037] The present invention will be described in detail below with reference to the accompanying drawings and examples.
[0038] This embodiment firstly relates to a preparation method of a microstructure with a constant aspect ratio. The method as a whole is to first prepare a substrate with a microstructure pattern on the surface by selective exposure by photolithography, and then fill the microstructure pattern with a sacrificial layer. liquid, and finally pour the PDMS and let the PDMS cure to obtain a constant aspect ratio microstructure.
[0039] Specifically, in combination with figure 1 As shown in , for the preparation of substrates with microstructure patterns, the surface of the substrate is firstly modified with perfluorooctyltriethoxysilane to make the surface of the modified substrate lyophob...
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