Cavity substrate with directional photoelectric transmission channel and manufacturing method thereof
A technology of photoelectric transmission and manufacturing method, applied in semiconductor/solid-state device manufacturing, circuits, optics, etc., and can solve problems such as volume reduction
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[0055] refer to figure 1 , shows a schematic cross-sectional view of the cavity substrate 100 with directional photoelectric transmission channels. The cavity substrate 100 includes a support frame 101 , a first dielectric layer 102 located on the lower surface of the support frame 101 and a second dielectric layer 103 located on the upper surface of the support frame 101 . The support frame 101, the first dielectric layer 102 and the second dielectric layer 103 form a closed cavity 104 with an opening on one side of the length direction of the substrate 100, and are arranged on the inner surface of the first dielectric layer 102 facing the cavity 104 There is a first circuit layer 1021 , and at least one electrode 105 connected to an optical communication device is arranged on the first circuit layer 1021 , and the electrode 105 is electrically connected to the first circuit layer 1021 . A second circuit layer 1022 is disposed on the outer surfaces of the first dielectric la...
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