Fluid system component mechanical property detection device, detection system and detection method

Abstract

The invention discloses a fluid system component mechanical property detection device, system and method. The device comprises a detection platform rack, an ascending disturbance detection mechanism is disposed at the top of the detection platform rack, and an immersion unit main body mechanism and a descending disturbance detection mechanism are disposed below the ascending disturbance detectionmechanism. A supporting base mechanism used for strengthening supporting and reducing external disturbance is installed at the bottom of the detection table rack, so that an effective simulation sceneof the fluid systems is established, and disturbance force or vibration mechanical property detection is conducted on components associated with the multiple fluid systems at the same time, and on the layout design of related sensors and flow paths. Therefore, inherent orientation and stress characteristics of fluid system components in a fluid system are reserved, and the situation that effective signals are excessively lost due to a transmission path or structure of disturbance signals under a complex structure is avoided; therefore, rapid and high-precision accurate measurement of the sensor on disturbance is achieved.

Description

technical field [0001] The invention relates to a mechanical property detection device of a fluid system component, a detection device, a detection system and a detection method for a mechanical property detection device of a fluid system component used in an immersion photolithography machine system. Background technique [0002] In the immersion lithography machine system, the immersion liquid is supplied and recovered in the immersion unit arranged between the projection objective lens and the substrate, so that the immersion unit between the projection objective lens and the substrate is filled and formed with a stable flow of fluid system. During the flow of the fluid system in the immersion unit, it will generate disturbance force to the projection objective lens, substrate, substrate table carrying the substrate, and the frame of the lithography machine. The diverter block next to the immersion unit is recycled to maintain the immersion unit. During the gas-liquid tw...

AI Technical Summary

Problems solved by technology

During the flow of the fluid system in the immersion unit, it will generate disturbance force to the projection objective lens, substrate, substrate table carrying the substrate, and the frame of the lithography machine. The diverter block next to the immersion unit is recycled to maintain the immersion unit. During the gas-liquid two-phase separation process of the mixed gas-liquid generated by the fluid flow inside, although the corresponding shock-absorbing or shock-absorbing structure is provided, it will also affect the projection objective lens, the substrate, and the substrate table carrying the substrate. And the whole frame of the lithography machine produces disturbance force; and the above two disturbance forces will change with the flow of the fluid system and the disturbance forces can be superimposed on each other, which will significantly affect the exposure and positioning process of the lithography machine, and ultimately affect Exposure quality, so in the fluid system, especially in the immersion system, the detection of the mechanical properties of components needs fine design and verification detection

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