Electrical testing method for threshold voltage uniformity of memory
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHANGHAI HUALI MICROELECTRONICS CORP
- Publication Date
- 2021-03-12
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Abstract
Description
technical field
[0001] The invention relates to the technical field of semiconductors, in particular to an electrical test method for the uniformity of the threshold voltage of a memory. Background technique
[0002] In memory development, the threshold voltage uniformity of each memory cell is an important indicator of memory cell technology. In the existing technology, taking 2T memory cells as an example, the memory cells are arranged in an array, and the main distance between each memory cell is The connection end includes a word line of the selection transistor (SG word line), a word line of the storage pipe (word line), a source line (source line), a drain area (drain line), and a base area.
[0003] After the storage unit is manufactured, it is necessary to perform an electrical test. In the electrical test (WAT) stage after the storage unit tape-out is completed, the method used in the prior art is to set test structures around the test unit, and each test structure ...