Monolithic integrated nBnBn four-waveband detector
A detector and integrated technology, which is applied in the direction of semiconductor devices, electrical components, circuits, etc., can solve the problems of large detector size and insufficient use of semiconductor manufacturing technology, etc., achieve high responsiveness, reduce composite current and surface leakage current , the effect of low dark current
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[0080] figure 1 and figure 2 They are respectively a cross-sectional view and a top view of the device structure of a monolithic integrated nBnBn four-band detector proposed in this embodiment. The monolithic integrated nBnBn four-band detector adopts a vertically integrated structure, including: GaSb substrate 1, n-type short-wave channel ohmic contact layer 2, first metal electrode layer 3, short-wave channel absorption layer 4, and first barrier layer 5 , Medium-wave channel absorbing layer 6, n-type medium-wave channel contact layer 7, common electrode layer 8, long-wave channel absorbing layer 9, second barrier layer 10, ultra-long-wave channel absorbing layer 11, n-type ultra-long-wave channel contact layer 12 , the second metal electrode layer 13 and the passivation layer 14;
[0081] The GaSb substrate 1 is 0.1-0.3 mm;
[0082] The n-type short-wave channel ohmic contact layer 2 has a doping concentration ≥ 10 18 cm 3 , with a thickness of 400nm±20nm, epitaxy on ...
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