Quick drainage device after silicon leakage of single crystal furnace
A single crystal furnace, a fast technology, applied in the direction of single crystal growth, single crystal growth, crystal growth, etc., can solve problems such as explosion, slowness, and gas can not escape.
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[0018] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0019] Please refer to figure 1 , figure 1 It is a schematic diagram of the overall structure of a specific embodiment provided by the present invention.
[0020] In a specific embodiment provided by the present invention, it mainly includes a vertical passage 1, an overflow tank 2 and an upper cover 3, the top of the vertical passage 1 communicates with the bottom of the single crystal furnace, and the bottom of the vertical passage 1 It communicates with t...
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