Ion beam etching equipment and etching method thereof
A technology of ion beam etching and ion beam, which is applied in the manufacture of electrical components, semiconductor/solid-state devices, circuits, etc. It can solve the problems of not having an independent loading and unloading chamber, chip damage, and long time to establish a vacuum.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Example Embodiment
[0035]Example 1
[0036]Such asfigure 1 withfigure 2As shown, the ion beam etching apparatus of the present embodiment includes a loading and unloading chamber 1, a transport chamber 2 and at least one of the transport substrates (such as infrared devices) and at least one etch chamber 3 for etching substrates; The loading and unloading chamber 1 and the etch chamber 3 are connected to the transfer chamber 2, respectively; the loading and unloading chamber 1 and the transfer chamber 2 are provided with an isolation valve 4; between the transport chamber 2 and the etch chamber 3 An isolation valve 4 is provided; a transport chamber 2 is provided with a transport mechanism 21 for transmitting a substrate.
[0037]In the present invention, the arrangement of loading and unloading chamber 1 is provided for storing different types of substrates, and a plurality of different types of substrates can be placed in one time, and the conveying chamber 2 is disposed. The substrate is realized in the ...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap