Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Novel vacuum system for mask manufacturing and feeding and discharging method

A technology for mask manufacturing and vacuum system, which is applied in the field of new vacuum system for mask manufacturing and loading and unloading, which can solve the problems of long interaction time, waste of production capacity and low efficiency of vacuum system.

Pending Publication Date: 2021-05-07
WUXI ZHONGWEI MASK ELECTRONICS
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to overcome the existing defects, provide a new type of vacuum system and a loading and unloading method for mask manufacturing, and solve the problems of low efficiency and waste of production capacity caused by the long interaction time of the current vacuum system

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel vacuum system for mask manufacturing and feeding and discharging method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The preferred embodiments of the present invention will be described below in conjunction with the accompanying drawings. It should be understood that the preferred embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

[0025] Such as figure 1 As shown, a new type of vacuum system for mask manufacturing includes a process chamber 1, a workpiece table 2 and a mechanical arm 3 are arranged in the process chamber 1, and a material inlet and outlet are provided on the side of the process chamber 1, and the process chamber 1 The outer side is provided with a loading and unloading cavity 4 at the inlet and outlet, the loading and unloading cavity 4 communicates with the process chamber 1 through the inlet and outlet, the inlet and outlet is provided with an electronically controlled internal closed door 5, and the loading and unloading cavity 4 is provided with a The feeding port connect...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the field of mask manufacturing, and provides a novel vacuum system for mask manufacturing. The novel vacuum system comprises a process cavity, wherein a workpiece table and a mechanical arm are arranged in the process cavity, a feeding and discharging cavity is arranged at a feeding and discharging port on the outer side of the process cavity, the feeding and discharging cavity is communicated with the process cavity through the feeding and discharging port, the feeding and discharging port is provided with an electric control inner sealing door, and the feeding and discharging cavity is provided with a feeding port communicated with the outside and provided with an electric control outer sealing door. The process cavity and the feeding and discharging cavity are each provided with a vacuum adjusting device. The invention further provides a feeding and discharging method of the vacuum system. According to the novel vacuum system for mask manufacturing and the feeding and discharging method, the feeding and discharging cavity is arranged in front of the process cavity, switching of the feeding and discharging vacuum environment is completed in the process, the influence of interaction on the process is reduced, the manufacturing time is shortened on the whole, the efficiency and the productivity are improved, meanwhile, the pre-storage box is additionally arranged in the process cavity, the process waiting time is saved, and the efficiency and the productivity are further improved.

Description

technical field [0001] The invention relates to a vacuum system and a loading and unloading method, in particular to a novel vacuum system and a loading and unloading method for mask manufacturing. Background technique [0002] The manufacturing process of semiconductor integrated circuits has entered the mass production stage of 14-16 nanometers, so more advanced lithography technology is required to carve thinner line widths and more complex patterns. In the photolithography process, a template is needed to transfer and copy the pattern, and this template is called a photomask (also known as a photomask, hereinafter collectively referred to as a mask). The mask plate is a link connecting the design company and the crystal garden manufacturing. At present, maskless lithography cannot be realized in the lithography process of the wafer factory. Therefore, the mask plate is an extremely critical part in the manufacture of integrated circuits. [0003] The main production pro...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B65G47/90
CPCB65G47/90
Inventor 华卫群尤春刘浩刘维维杨东海韦庆宇顾梦星
Owner WUXI ZHONGWEI MASK ELECTRONICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com