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Gas mixing for fast temperature control of a cooling hood

A mixer and controller technology, applied in the field of gas mixing for rapid temperature control of the cooling cover, can solve the problem of reducing accuracy

Pending Publication Date: 2021-05-14
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Local expansion of the substrate caused by heating will reduce the accuracy with which the projected pattern will overlap with the pattern already present on the substrate

Method used

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  • Gas mixing for fast temperature control of a cooling hood
  • Gas mixing for fast temperature control of a cooling hood
  • Gas mixing for fast temperature control of a cooling hood

Examples

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Embodiment Construction

[0074] figure 1 A lithographic system comprising a radiation source SO and a lithographic apparatus LA is shown. The radiation source SO is configured to generate a beam B of EUV radiation and to provide the beam B of EUV radiation to the lithographic apparatus LA. The lithographic apparatus LA comprises an illumination system IL, a support structure MT configured to support a patterning device MA (eg a mask), a projection system PS and a substrate table WT configured to support a substrate W.

[0075] The illumination system IL is configured to condition the EUV radiation beam B before it is incident on the patterning device MA. Wherein, the illumination system IL may include a faceted field mirror device 10 and a faceted pupil mirror device 11 . The facet field mirror arrangement 10 and the facet pupil mirror arrangement 11 together provide the EUV radiation beam B with a desired cross-sectional shape and a desired intensity distribution. The illumination system IL may co...

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Abstract

The present invention relates to a system comprising a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system comprises: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also described is a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to the methods described herein.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from European application 18198758.7 filed on October 5, 2018 and European application 19197024.3 filed on September 12, 2019. The entire contents of these two European applications are hereby incorporated by reference. technical field [0003] The present invention relates to a system suitable for use in a lithographic apparatus and a method suitable for use with a lithographic apparatus. Background technique [0004] A lithographic apparatus is a machine configured to apply a desired pattern to a substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). For example, a lithographic apparatus may project a pattern at a patterning device (eg, a mask) onto a layer of radiation-sensitive material (resist) disposed on a substrate. [0005] To project a pattern onto a substrate, a lithographic apparatus may use electromagnetic radiation. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20F25D3/10
CPCG03F7/70783G03F7/70875F25D3/10
Inventor 约斯特·德胡格A·L·C·勒鲁A·M·A·惠杰伯特斯C·L·瓦伦汀R·C·维特D·V·P·汉斯乔特F·范德穆伦J·F·M·范桑特沃尔特拉杜·唐纳斯
Owner ASML NETHERLANDS BV
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