Light-receiving member, image forming apparatus and image forming method
A technology for light-receiving components and images, applied in the manufacturing of optics, electrical components, semiconductor/solid-state devices, etc., and can solve problems such as unrealistic
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example 1
[0097] The plasma CVD apparatus shown in FIG. 2 was used to deposit a lower stopper layer and a photoconductive layer on a cylindrical aluminum substrate under the conditions shown in Table 1 in the following order, and then in the following order. A surface layer is formed under conditions to complete a photosensitive member (drum). In this operation, CF 4 The flow rate of 1 was varied at five levels in the range of 20 to 100 sccm as shown in Table 4, while the high-frequency power was varied at three levels in the range of 800 to 1200 W, thereby obtaining five photosensitive members. Pre-measurement of the samples confirmed that in the above CF 4 In the range of flow and high frequency power, 1120cm -1 / 2920cm -1 The peak area ratios ranged from 0.14 to 47.8, while 1200cm -1 / 2920cm -1 The peak area ratio was in the range from 0.31 to 48.3.
[0098] In order to evaluate the abrasion resistance of the five drums produced in the above-described manner, each drum was rota...
example 2
[0127] CH 4 : 100sccm
[0128] CF 4 : Variable (20-100sccm)
[0129] Power: Variable (400-800W)
[0130] Frequency: 105MHz
[0131] Internal pressure: 2mTorr
[0132] Film thickness: 0.1μm Table 4
[0133] CH 4 flow rate
(sccm)
CF 4 flow rate
(sccm)
power
(W)
IR peak ratio
1120cm -1 /
2920cm -1
IR peak rate
1200cm -1 /
2920cm -1
L
(relative amount)
example 1
100
100
100
100
100
40
80
20
60
100
800
1000
1200
1200
1200
7.4
25.6
0.15
10.2
47.8
9.1
34.8
0.31
12.3
48.3
AA
A
AA
A
B
Comparative Example 1
100
100
800
53.6
89.1
C
[0134] AA: No wear observed
[0135] A: very little wear
[0136] B: Comparable to SiC surface layer
[0137]...
example 3
[0159] The plasma CVD apparatus shown in FIG. 2 was used to deposit a lower stopper layer and a photoconductive layer on a cylindrical aluminum substrate under the conditions shown in Table 1 in the following order, and in this way six layers were fabricated. a photosensitive component. The plasma CVD apparatus shown in FIG. 2 was then used under the conditions shown in Table 6, using six fluorine-containing gases CF 4 , CHF 3 , CF 2 F 6 , CF 2 =CF 2 , CIF 3 and SF 6 , forming a surface layer. In this operation, pre-measurement of the sample confirms that in the above CF 4 In the range of flow and high frequency power, 1120cm -1 / 2920cm -1 The peak area ratio of and 1200cm -1 / 2920cm -1 The peak area ratios are all in the range from 10 to 30.
[0160] Each photosensitive member was then subjected to evaluation of film thickness change by polishing test, evaluation of image blur after polishing under high temperature and high humidity, and determination of fluorine...
PUM
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