A Diffusion Method Applicable to LDSE Technology
A diffusion method and technology, which is applied in the field of solar cells, can solve the problems of low metal contact area and affect the improvement of battery performance, and achieve the effects of reducing square resistance, improving Eff, and reducing Rs and FF losses
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Embodiment 1
[0050] This embodiment provides a diffusion method suitable for laser doping technology, including the following steps:
[0051] The silicon wafer is textured to form a light-trapping structure textured surface. After texturing, the silicon wafer enters a diffusion furnace for single-sided diffusion. The diffusion surface is an N-type emitter, and the back is a P-type surface to form a PN junction.
[0052] The diffusion process includes the following steps:
[0053] (1) Open the furnace door: the atmosphere conditions are, BN 2 (flow 3000sccm), SN 2 (flow 0), BO 2 (flow 3000sccm), SO 2 (flow 1000sccm), pressure (1060mbar);
[0054] (2) Entering the boat: the atmospheric conditions are, BN 2 (flow 3000sccm), SN 2 (flow 0), BO 2 (flow 0), SO 2 (flow 0), pressure (1060mbar);
[0055] (3) Heating up: BN 2 (flow 0), SN 2 (flow 0), BO 2 (flow 0), SO 2 (flow 0), pressure (100mbar);
[0056] (4) Pre-oxidation: BN 2 (flow 0), SN 2 (flow 0), BO 2 (flow 0), SO 2 (flow ...
Embodiment 2-5
[0067] Change the temperature and time of each step, see Table 1 for details.
Embodiment 6
[0069] Except that the cooling rate was adjusted to 0.3°C / min, other methods and conditions were the same as in Example 1.
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