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Method for cleaning micro-nano particles through magnetic field constraint double-beam pulse laser induced shock waves

A technology of pulsed laser and micro-nano particles, which is applied in cleaning methods and appliances, chemical instruments and methods, semiconductor/solid-state device manufacturing, etc., can solve the problems of product performance degradation and product scrapping, and achieve convenient control, enlarged cleaning area, The effect of improving cleaning efficiency

Inactive Publication Date: 2021-07-13
ZHEJIANG UNIV OF TECH
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Problems solved by technology

[0002] Particle pollution will inevitably adhere to the surface of the product under the influence of product manufacturing or working environment. Its product performance will be greatly reduced, and sometimes even lead to product scrap

Method used

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  • Method for cleaning micro-nano particles through magnetic field constraint double-beam pulse laser induced shock waves

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Embodiment Construction

[0025] The present invention will be further described below in conjunction with the accompanying drawings.

[0026] refer to figure 1 , a method for cleaning micro-nano particles with a magnetic field-confined double-beam pulsed laser-induced shock wave, the method comprising the following steps:

[0027] 1) bonding the substrate 11 to be cleaned on the three-dimensional mobile platform 10, and moving the three-dimensional mobile platform 10 so that the substrate 10 to be cleaned is located directly below the focus point 16 of the laser pulse;

[0028] 2) Use the first pulsed laser beam 4 and the second pulsed laser beam 7 to focus between the permanent magnet N pole 13 and the permanent magnet S pole 17 to induce gas breakdown to generate a plasma shock wave 15, so that the microscopic particles on the surface of the substrate 11 to be cleaned are Nanoparticle pollutants (12) fly away from the surface of the substrate 10 to be cleaned under the action of the removal force o...

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Abstract

The invention discloses a method for cleaning micro-nano particles through magnetic field constraint double-beam pulse laser induced shock waves. The method comprises the following steps that (1), a substrate to be cleaned is bonded to a three-dimensional moving platform, and the three-dimensional moving platform is moved so that the substrate to be cleaned can be located under a laser pulse focusing point; and (2), a pulse laser beam and a pulse laser beam are focused between the permanent magnet N pole and the permanent magnet S pole to induce gas breakdown to generate plasma shock waves, so that micro-nano particle pollutants on the surface of the to-be-cleaned substrate fly away from the surface of the to-be-cleaned substrate under the action of shock wave removal force. According to the method, while the advantages of environment friendliness, convenience in control and effective removal of cleaning blind areas of double-beam pulse laser-induced shock wave cleaning are reserved, the plasma intensity and duration can be enhanced through the constraint effect of the magnetic field, the shock wave intensity is enhanced, and the cleaning area and cleaning efficiency of the substrate are improved.

Description

technical field [0001] The invention relates to surface cleaning technology, in particular to a method for cleaning micro-nano particles by magnetic field-confined double-beam pulsed laser-induced shock waves. Background technique [0002] Particle pollution will inevitably adhere to the surface of the product under the influence of product manufacturing or working environment. Its product performance will be greatly reduced, and sometimes even lead to product scrap. [0003] Double-beam pulsed laser-induced plasma shock wave cleaning is to focus directly in the gas atmosphere, induce gas ionization to generate plasma shock waves, and use the force of the waves to remove nano-particle pollutants on the surface of the substrate to be cleaned. This technology avoids the direct interaction between the laser and the substrate, and can suppress the cleaning dead zone existing in traditional single-pulse laser-induced plasma cleaning. Contents of the invention [0004] In orde...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B7/00H01L21/67
CPCB08B7/0042H01L21/67028
Inventor 范丽莎姚建华张群莉王梁张硕文
Owner ZHEJIANG UNIV OF TECH
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