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Second harmonic generation (SHG) optical inspection system designs

A second harmonic generation and optical detection technology, applied in optics, optical components, nonlinear optics, etc., can solve problems such as major obstacles that have not been overcome

Pending Publication Date: 2021-07-23
菲拓梅里克斯公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the teachings of these patents do not appear to overcome some of the major obstacles to the adoption of SHG as a mature technology in semiconductor manufacturing and metrology

Method used

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  • Second harmonic generation (SHG) optical inspection system designs
  • Second harmonic generation (SHG) optical inspection system designs
  • Second harmonic generation (SHG) optical inspection system designs

Examples

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Embodiment Construction

[0151] first part

[0152] Figure 1 is a schematic diagram of a system 100 that may be used in conjunction with the methods of the present invention. For example, for intermediate optical elements, including optical delay lines and optional electrode features, in U.S. Provisional Application No. 61 / 980,860, filed April 17, 2014, entitled "WAFERMETROLOGY TECHNOLOGIES" Other suitable system variations are set forth in the section entitled "CHARGE DECAY MEASUREMENT SYSTEMS AND METHODS" referred to as Section II.

[0153] As shown, system 100 includes a primary or probe laser 10 for directing an interrogation beam 12 of electromagnetic radiation onto a sample wafer 20 held by a vacuum chuck 30 . like Figure 1B As shown, the chuck 30 includes, or is disposed on, an x-stage and a y-stage, and optionally, the chuck also includes a rotary table for adjusting the position relative to the laser aiming position. Spots 22 are located on the wafer. The x-y stage enables scanning of ...

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Abstract

Second Harmonic Generation (SHG) can be used to interrogate a surface of a sample such as a layered semiconductor structure. The SHG based sample interrogation systems may simultaneously collect different polarization components of the SHG signal at a time to provide different types of information. SHG imaging systems can provide SHG images or maps of the distribution of SHG signals over a larger area of a sample. Some such SHG imaging systems employ multiple beams and multiple detectors to capture SHG signals over an area of the sample. Some SHG imaging systems employ imaging optics to image the sample onto a detector array to form SHG images.

Description

[0001] Cross References to Related Applications [0002] This application is filed under 35 U.S.C. §119(e) on May 15, 2018 and is entitled "SECOND HARMONIC GENERATION (SHG) IMAGING BASED OPTICAL INSPECTION SYSTEM DESIGN (Optical Inspection System Based on Second Harmonic Generation (SHG) Imaging Design)" and filed on May 15, 2018, entitled "SYSTEM DESIGN FOR HYBRID-POLARIZATION OPTICAL SECONDHARMONIC GENERATION" 62 / 671,611, both of which are hereby incorporated by reference in their entirety. technical field [0003] The present application relates to systems for Second Harmonic Generation (SHG) based wafer inspection, semiconductor metrology, material characterization, surface characterization and / or interface analysis. Background technique [0004] In nonlinear optics, the beam input is output as the sum, difference or harmonic frequencies of the inputs. Second harmonic generation (SHG) is a nonlinear effect in which light is emitted at an angle from a material at twice...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/88G01N21/95G01N21/01
CPCG01N21/636G01N21/9501G01N21/8806G01N2021/218G01N2021/8848G01N21/8851G01N21/01G01N2021/8845G01N2021/8887G01N21/211G02B26/123G02F1/37
Inventor 雷鸣
Owner 菲拓梅里克斯公司
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