High-transmittance and low-resistance composite ITO film

Abstract

The invention relates to the field of ITO films, and particularly discloses a high-transmittance and low-resistance composite ITO film. The composite ITO film comprises a noble metal doped layer and an ITO film layer which are sequentially arranged on the surface of a substrate from inside to outside, and the noble metal doped layer is prepared by doping nano noble metal particles and nano metal particles. According to the technical scheme, the ITO film layer is arranged on the surface of the noble metal doped layer, high transmittance in a visible light region is obtained through the antireflection effect of the ITO film with the high refractive index, and on the basis, the noble metal doped layer is modified, so light scattering and photon absorption of the film are reduced, and the light transmission performance of the single-layer ITO thin film layer is improved; and the high-transmittance and low-resistance composite ITO film can be used in the aspects of displays, dimming films, electromagnetic shielding, infrared heat insulation and the like, and has excellent light transmittance, conductivity and infrared heat insulation performance.

Description

technical field

[0001] The application relates to the field of ITO thin films, more specifically, it relates to a composite ITO film with high light transmission and low resistance value. Background technique

[0002] The ITO transparent conductive film has a high transmittance to visible light, a high reflectivity to infrared light, and a high attenuation rate to microwaves. It is these special photoelectric properties that make it widely used in products such as flat-panel displays, solar cells, heat-insulating and energy-saving glass, defrosting glass, and electromagnetic shielding films.

[0003] With the continuous development of technology, the requirements for the conductivity and transmittance and reflectivity of ITO transparent conductive film are constantly increasing, so it is difficult to meet its requirements only by using a single material. At present, films with high conductivity and high transmittance and reflectivity are prepared using a multi-layer structu...

Examples

preparation example 1

[0041] 85% by mass percentage of nano-Ag particles and 15% of nano-Ni particles were doped and mixed with stirring to collect a mixed noble metal doped layer target 1 .

preparation example 2

[0043] 90% by mass percentage of nano-Ag particles and 10% of nano-Ni particles were doped and mixed with stirring, and the mixed noble metal doped layer target 2 was collected.

preparation example 3

[0045] 85% by mass percentage of nano-Ag particles and 15% of nano-Ni particles were doped and mixed with stirring to collect a mixed noble metal doped layer target 3 .

technical field

[0001] The application relates to the field of ITO thin films, more specifically, it relates to a composite ITO film with high light transmission and low resistance value. Background technique

[0002] The ITO transparent conductive film has a high transmittance to visible light, a high reflectivity to infrared light, and a high attenuation rate to microwaves. It is these special photoelectric properties that make it widely used in products such as flat-panel displays, solar cells, heat-insulating and energy-saving glass, defrosting glass, and electromagnetic shielding films.

[0003] With the continuous development of technology, the requirements for the conductivity and transmittance and reflectivity of ITO transparent conductive film are constantly increasing, so it is difficult to meet its requirements only by using a single material. At present, films with high conductivity and high transmittance and reflectivity are prepared using a multi-layer structu...

Examples

preparation example 1

[0041] 85% by mass percentage of nano-Ag particles and 15% of nano-Ni particles were doped and mixed with stirring to collect a mixed noble metal doped layer target 1 .

preparation example 2

[0043] 90% by mass percentage of nano-Ag particles and 10% of nano-Ni particles were doped and mixed with stirring, and the mixed noble metal doped layer target 2 was collected.

preparation example 3

[0045] 85% by mass percentage of nano-Ag particles and 15% of nano-Ni particles were doped and mixed with stirring to collect a mixed noble metal doped layer target 3 .

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