A full-color toning COB light source and method of making the same
A manufacturing method and light source technology, applied in semiconductor devices, electrical components, circuits, etc., can solve problems affecting COB chip light emission and leakage, and achieve high reliability, reduce glue overflow, and simple processing technology
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Embodiment 1
[0058] A method for manufacturing a full-color toning COB light source, comprising the following steps:
[0059] (1) Prepare the packaging substrate:
[0060] A. Take the single-sided copper-clad laminate, cut it into a preset size, and set it aside; the single-sided copper-clad laminate includes the single-sided copper-clad laminate substrate 1 and the copper plating layer 2;
[0061] B. Use a brushing machine to remove the oxide film on the surface of the copper clad laminate, coat the positive photoresist 3 on the copper plating layer 2 on the surface of the copper clad laminate, bake and cure, expose the pattern of the solid crystal area through the mask plate, and place it in the developing Develop and etch in the liquid to form several solid crystal regions;
[0062] C. Place the single-sided copper-clad laminate in an ICP etching machine, perform ICP etching on the die-bonding area and form a die-bonding groove, and remove the positive photoresist; the ICP etching dept...
Embodiment 2
[0080] A method for manufacturing a full-color toning COB light source, comprising the following steps:
[0081] (1) Prepare the packaging substrate:
[0082] A. Take the single-sided copper-clad laminate, cut it into preset specifications and sizes, and set aside;
[0083] B. Use a brushing machine to remove the oxide film on the surface of the copper-clad laminate, apply a positive photoresist on the copper-plated layer 2 on the surface of the copper-clad laminate, bake and cure, expose the pattern of the crystal-bonding area through the mask plate, and place it in the developing
[0084] Develop and etch in the liquid to form several solid crystal regions;
[0085] C. Place the single-sided copper-clad laminate in an ICP etching machine, perform ICP etching on the die-bonding area and form a die-bonding groove; remove the positive photoresist; the ICP etching depth is a, and the thickness of the COB chip is b ,
[0086] The thickness of the copper plating layer 2 is c, t...
Embodiment 3
[0104] A method for manufacturing a full-color toning COB light source, comprising the following steps:
[0105] (1) Preparation of packaging substrate:
[0106] A. Take the single-sided copper-clad laminate, cut it into a preset size, and set it aside;
[0107] B. Use a brushing machine to remove the oxide film on the surface of the copper-clad laminate, apply a positive photoresist on the copper-plated layer 2 on the surface of the copper-clad laminate, bake and cure, expose the pattern of the crystal-bonding area through the mask plate, and place it in the developing
[0108] Develop and etch in the liquid to form several solid crystal regions;
[0109] C. Place the single-sided copper-clad laminate in an ICP etching machine, perform ICP etching on the die-bonding area and form a die-bonding groove; remove the positive photoresist; the ICP etching depth is a, and the thickness of the COB chip is b ,
[0110] The thickness of the copper plating layer 2 is c, then c+0.5b=a...
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