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Multi-layer automatic focusing method and system

An automatic focus and focal plane technology, applied in the field of image processing, can solve the problems of system judgment error, strong focus position, interference, etc., to achieve the effect of accurate focus

Active Publication Date: 2021-08-17
BEIJING LUSTER LIGHTTECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although the second method can achieve real-time and accurate imaging, its disadvantage is that the focus position requires strong reflected light, so that it can only focus on the surface of the cover glass or the position with a large difference in refractive index between the upper and lower layers. Target objects with multiple highly reflective planes often cause interference, which leads to wrong judgment of the system
Therefore, the second method cannot accurately focus on objects with multiple depth planes

Method used

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  • Multi-layer automatic focusing method and system
  • Multi-layer automatic focusing method and system

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Embodiment Construction

[0049] refer to figure 1 , figure 1 A multi-layer autofocus system is shown, the system includes: a light source 1, a collimating lens 2, a semicircular diaphragm 3, a half mirror 4, a microscope objective lens 5, an object stage 6, a focusing Lens 7 , area array detector 8 and data processing unit 9 .

[0050] The light source 1 adopts a laser light source and is arranged above the collimator lens for emitting laser beams to the collimator lens 2 .

[0051] In a possible design, a laser light source with a wavelength of 850nm is used, which belongs to the biological and human eye safety band.

[0052] The collimating lens 2 is used to expand the laser beam so that the diameter of the laser beam is larger than the aperture of the microscope objective lens 5; the collimating lens 2 collimates the laser beam.

[0053] In a possible design, the collimating lens 2 expands the laser beam to a diameter of 16 mm, so that the diameter of the laser beam is larger than the aperture o...

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Abstract

The invention discloses a multi-layer automatic focusing method and system, and the method comprises the steps: adding a semicircular diaphragm in the multi-layer automatic focusing system, enabling light spots focused on a detector plane to be distributed at the upper and lower sides of a detector according to the difference of focusing positions, and enabling the focusing position of an objective lens to be quickly judged. The multi-layer automatic focusing method is applied to the multi-layer automatic focusing system, in the multi-layer automatic focusing method, an evaluation function related to the light spot intensity and the size diameter is provided, the moving direction can be accurately judged according to light spots, the moving step length can be accurately determined, and the focusing accuracy can be accurately judged. According to the technical scheme, real-time, rapid and accurate focusing can be carried out on the target object with multiple layers of plane depths.

Description

technical field [0001] The invention belongs to the technical field of image processing, and in particular relates to a method and system for multi-layer automatic focusing. Background technique [0002] Based on the development of image processing technology and digital imaging system, the development of microscopes has gradually moved towards serialization, integration and intelligence. Microscopes play an important role in various fields such as life science and material science. Autofocus technology is the core function of the microscope. Autofocus refers to the process of receiving the reflected light of the object through the photoelectric sensor, and controlling the electric focusing device according to the calculation and processing inside the imaging device, so as to obtain a clear image on the image detector. [0003] The existing autofocus technologies in microscopes are mainly divided into two categories. The first one is to obtain image information by shooting t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B21/24G02B21/00G02B21/08
CPCG02B21/244G02B21/006G02B21/08
Inventor 吴凡
Owner BEIJING LUSTER LIGHTTECH
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