Clean room system for semiconductor manufacturing and multistage electric field dust removal method thereof

Abstract

The invention provides a clean room system for semiconductor manufacturing and a multi-stage electric field dust removal method thereof. The clean room system comprises a clean room and a multi-stage electric field dust removal system; the multi-stage electric field dust removal system comprises at least two electric field devices connected in series and further comprises a power supply, and an electric field anode and an electric field cathode of each electric field device are electrically connected with two electrodes of the power supply device respectively; the voltage value of the power supply of the electric field device is enough to ensure that the total dust removal efficiency (100%-(100%-P1%) * (100%-P2%) *...... * (100%-Pn%) of the electric field dust removal system is greater than a preset value, the ozone output quantity is smaller than a preset value, P1%, P2%...... Pn% are the dust removal efficiency of the first-stage electric field device, the dust removal efficiency of the second-stage electric field device,..., the dust removal efficiency of the n-th-stage electric field device respectively in sequence, and n is an integer greater than 1.

Description

technical field [0001] The invention belongs to the field of air purification, in particular to a clean room system for semiconductor manufacturing and a multistage electric field dust removal method thereof. Background technique [0002] With the advancement of technology, the size of semiconductor devices is getting smaller and smaller, and the requirements for the environment of semiconductor manufacturing workshops are also getting higher and higher. The clean room is a commonly used manufacturing workshop environment in the semiconductor manufacturing process. The purpose is to prevent particles, humidity, temperature, etc. from polluting semiconductor materials, thereby affecting the yield and reliability of semiconductors. According to the cleanliness requirements of the production process for the production environment, each clean room has different air cleanliness levels, which are usually divided by the maximum concentration limit of a certain particle size in the ...

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Problems solved by technology

[0008] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a clean room system for semiconductor manufacturing and its multi-stage electric field dust removal method, to solve the contradiction between electrostatic dust removal efficiency and excessive ozone concentration, and the existing semiconductor manufacturing At least one technical problem of air purification technology in the field of large power consumption, large volume, high cost, and inability to remove nano-scale particles in the air

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