Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Semiconductor coating technology educational training and assessment method based on virtual reality

A technical education and virtual reality technology, applied in the field of education, training and assessment of semiconductor coating technology based on virtual reality, can solve the problems of venue, equipment and teaching staff level limitations, achieve high promotion value, expand the training scale and efficiency

Inactive Publication Date: 2021-10-29
苏州芯才科技有限公司
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In terms of coating process training, it is limited by venues, equipment, and the level of teaching staff.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Semiconductor coating technology educational training and assessment method based on virtual reality

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0024] Such as figure 1 The shown virtual reality-based semiconductor coating technology education training and examination method includes the following steps:

[0025] Step 1: Run the host system, connect the server of the host system with the client, and the trainees log in to the host system according to their own accounts and passwords;

[0026] Step 2: The system imports the corresponding semiconductor coating process courseware according to the authority of the trainee, and displays the coating process principle, operation skill training items and assessment items on the display interface. The trainee selects the item to be trained. If it is the process principle, go to step 3. If it is an operation skill training project, go to step 4, and if it is an assessment project, go to step 5;

[0027] Step 3: Enter the interface of the process principle module, and the trainees will conduct a basic assessment after viewing the coating process and equipment introduction. The t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a semiconductor coating technology educational training and assessment method based on virtual reality. Basic coating equipment and technological processes are known through an equipment technology module, basic coating operation skills are mastered through an operation skill training module, and finally system scores, archives and related operation error points are given through an assessment module. According to the semiconductor coating technology educational training and assessment method based on virtual reality, the virtual scene of the semiconductor coating processing process is constructed through the VR technology, restrictions in various aspects such as space, equipment, environment and raw material supply are overcome, the training scale and efficiency of semiconductor technicians are expanded, and the method has very high popularization value.

Description

technical field [0001] The invention belongs to the technical field of semiconductor processing education, in particular to a method for education, training and assessment of semiconductor coating technology based on virtual reality. Background technique [0002] The complete manufacturing process of semiconductor devices is an extremely complex system engineering chip production equipment is huge and complex, the process environment is strict, and the supply of raw materials, reagents and high-purity special gases has extremely high standards. At present, my country relies heavily on chips imported from abroad. Although the domestic semiconductor industry is gradually breaking through foreign technology blockades, there is still a big gap from the international advanced level. [0003] The current coating training usually first learns the basic principles related to coating, equipment information, basic process of coating process, operation steps and corresponding precautio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G09B9/00
CPCG09B9/00
Inventor 吴方岩
Owner 苏州芯才科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com