Carbon dioxide laser superhard film and preparation method thereof

A technology of carbon dioxide and laser, which is applied in the field of carbon dioxide laser superhard film and its preparation, to achieve the effect of good preparation repeatability, excellent optical performance and strong film adhesion

Pending Publication Date: 2021-11-02
NANJING WAVELENGTH OPTO ELECTRONICS SCI & TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This new type of material called CO2 can be used for making tools that are resistant against damage caused by high levels of light or radiation such as sunlight. It's made up mostly of tiny layers - one part per million (pp) long – creating special properties like low absorption at certain wavelength ranges. These materials have great stability over time without losing their effectiveness due to factors like temperature changes or other environmental conditions during storage.

Problems solved by technology

This patented technical problem addressed by this patents relates to improving the durability and efficiency of windows for use in electronic devices such as cameras that require protection from damage caused during photographying operations. Current materials like dichroic dyes are very expensive due to their complicated manufacturing processes required, making them difficult to apply onto large surfaces without causing cracks overtime. Additionally, these coatings often lose some of its effectsiveness when exposed to extreme environments where they can break down easily under pressure.

Method used

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  • Carbon dioxide laser superhard film and preparation method thereof
  • Carbon dioxide laser superhard film and preparation method thereof
  • Carbon dioxide laser superhard film and preparation method thereof

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Embodiment 1

[0027] Such as figure 1 As shown, a carbon dioxide laser superhard film, the film layer structure is: SUB / aHbLcHdM / A, wherein, SUB represents ZnSe substrate, A represents air, H represents Ge, L represents ZnS, M represents DLC; a, b, c and d represent the coefficients of the quarter reference wavelength optical thickness of each layer, a is 5.44, b is 3.18, c is 0.82, and d is 1.27.

[0028] The preparation of the above-mentioned carbon dioxide laser superhard film comprises the following steps:

[0029] 1) Clean the substrate before coating: use a degreasing cloth dipped in a 1:3 mixture of absolute ethanol and ether to wipe to remove residual dirt on the surface.

[0030] 2) Before evaporation, ion bombardment is carried out on the substrate for 5 minutes, and then film deposition is carried out. The evaporation rate of ZnS is controlled at 1nm / s, and the evaporation rate of Ge is controlled at 0.2nm / s. During the process of film deposition, use consideration Fenman ion s...

Embodiment 2

[0034] Such as figure 1 As shown, a carbon dioxide laser superhard film, the film layer structure is: SUB / aHbLcHdM / A, wherein, SUB represents ZnSe substrate, A represents air, H represents Ge, L represents ZnS, M represents DLC; a, b, c and d represent the coefficients of the quarter reference wavelength optical thickness of each layer, a is 4.59, b is 2.62, c is 1.19, and d is 0.17.

[0035]The preparation of the above-mentioned carbon dioxide laser superhard film comprises the following steps:

[0036] 1) Clean the substrate before coating: use a degreasing cloth dipped in a 1:3 mixture of absolute ethanol and ether to wipe to remove residual dirt on the surface.

[0037] 2) Before evaporation, ion bombardment is carried out on the substrate for 5 minutes, and then film deposition is carried out. The evaporation rate of ZnS is controlled at 1nm / s, and the evaporation rate of Ge is controlled at 0.2nm / s. During the process of film deposition, use consideration Fenman ion so...

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Abstract

The invention discloses a carbon dioxide laser superhard film and a preparation method thereof. The film layer structure of the carbon dioxide laser superhard film is SUB/aHbLcHdM/A, wherein SUB represents a ZnSe substrate; A represents air; H represents Ge; L represents ZnS; M represents DLC; and a, b, c and d represent coefficients of the quarter reference wavelength optical thickness of each layer. According to the carbon dioxide laser super-hard film, the laser superhard film which is excellent in optical performance, good in preparation repeatability, high in film layer adhesive force and resistant to friction is obtained by using extremely few spacing film layers; the transmittance of the antireflection film at the wave bands of 10.6 microns and 9.4 microns is larger than 99.5%; and the use requirement of a laser protection window is met.

Description

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Claims

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Application Information

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Owner NANJING WAVELENGTH OPTO ELECTRONICS SCI & TECH CO LTD
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