Flexible circuit substrate and preparation method and application thereof
A technology for flexible circuit substrates and conductive layers, applied in the direction of circuit substrate materials, printed circuit manufacturing, printed circuits, etc., can solve the problems of increased equipment cost, difficulty in large-precision control, and increased cost of preparation processes, so as to improve the bonding strength and improve Peel strength and cost reduction effect
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[0024] The preparation method of the flexible circuit substrate provided by the present invention comprises:
[0025] S1, providing a liquid crystal polymer film and a conductive layer, and performing surface activation treatment on at least one surface of the liquid crystal polymer film and at least one surface of the conductive layer under atmospheric pressure;
[0026] S2, the conductive layer after the surface activation treatment is laminated on at least one surface of the liquid crystal polymer film after the surface activation treatment, and the liquid crystal polymer film after the surface activation treatment The surface is bonded to the surface of the conductive layer after surface activation treatment, and subjected to cold pressing treatment to obtain a prefabricated board;
[0027] S3, performing heat and pressure treatment on the prefabricated board to obtain a flexible circuit substrate, wherein a transition connection layer is formed at the contact surface of t...
Embodiment 1
[0053] Provide a liquid crystal polymer film with a thickness of 35 μm, and perform plasma surface activation treatment on the liquid crystal polymer film at room temperature and atmospheric pressure, wherein the plasma gas is oxygen, the activation time is 100s, and the radio frequency power is 300W.
[0054] Provide a copper foil with a thickness of 25 μm, the surface roughness of the copper foil is 0.1 μm, and Rz is 0.95 μm. At room temperature and atmospheric pressure, the copper foil is subjected to plasma surface activation treatment, wherein the plasma gas is oxygen, and the activation time is 150s, the RF power is 100W.
[0055] On one surface of the copper foil after the surface activation treatment, the liquid crystal polymer film after the surface activation treatment is laminated, and cold pressing is carried out in a dust-free environment to obtain a prefabricated board, wherein the pressure is 0.1MPa, and the temperature is room temperature. The time is 30s.
[...
Embodiment 2
[0059] Provide a liquid crystal polymer film with a thickness of 35 μm, and perform plasma surface activation treatment on the liquid crystal polymer film at room temperature and atmospheric pressure, wherein the plasma gas is oxygen, the activation time is 100s, and the radio frequency power is 300W.
[0060] Provide a copper foil with a thickness of 25 μm, the surface roughness of the copper foil is 0.1 μm, and Rz is 0.95 μm. At room temperature and atmospheric pressure, the copper foil is subjected to plasma surface activation treatment, wherein the plasma gas is oxygen, and the activation time is 150s, the RF power is 100W.
[0061] On one surface of the copper foil after the surface activation treatment, the liquid crystal polymer film after the surface activation treatment is laminated, and cold press treatment is carried out in a dust-free environment to obtain a prefabricated board, wherein the pressure is 2.5MPa, and the temperature is room temperature. The time is 30...
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