Method for rapidly identifying different back silver sintering and passivating effects
A silver-backed and fast technology, applied in photovoltaic power generation, electrical components, climate sustainability, etc., can solve problems such as reduced product profits, low back-silver efficiency, long-term experiments, etc., to save economic costs, effective testing methods, The effect of saving time and cost
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Embodiment 1
[0039] A method for quickly identifying different back silver sintering passivation effects, comprising the following steps:
[0040] (1) plating a silicon nitride film with a thickness of 70nm on the front side of the silicon wafer 3; plating a silicon nitride film of 80nm on the back side of the silicon wafer 3;
[0041] (2) Print the first back silver paste on the silicon wafer 3 plated with a silicon nitride passivation film;
[0042] (3) Dry the first back silver paste at 230°C after printing (the back silver effect after drying is as follows: figure 2 shown);
[0043] (4) The silicon wafer is then rotated 90°, and the second type of back silver paste is printed;
[0044] (5) The second type of back silver paste is dried again at 250°C after printing (the back silver effect after drying is as follows: image 3 shown);
[0045] (6) Place the dried silicon wafer in a sintering furnace for sintering, the initial sintering temperature is 400°C, the temperature is raised to...
Embodiment 2
[0051] A method for quickly identifying different back silver sintering passivation effects, comprising the following steps:
[0052] (1) plating a silicon nitride film with a thickness of 80nm on the front side of the silicon wafer 3; plating a silicon nitride film of 85nm on the back side of the silicon wafer 3;
[0053] (2) Print the first back silver paste on the silicon wafer 3 plated with a silicon nitride passivation film;
[0054] (3) Dry the first back silver paste at 280°C after printing (the back silver effect after drying is as follows: figure 2 shown);
[0055] (4) The silicon wafer is then rotated 90°, and the second type of back silver paste is printed;
[0056] (5) The second type of back silver paste is dried again at 280°C after printing (the back silver effect after drying is as follows: image 3 shown);
[0057] (6) Place the dried silicon wafer in a sintering furnace for sintering, the initial sintering temperature is 400°C, the temperature is raised ...
Embodiment 3
[0061] A method for quickly identifying different back silver sintering passivation effects, comprising the following steps:
[0062] (1) plating a silicon nitride film with a thickness of 75nm on the front side of the silicon wafer 3; plating a 90nm silicon nitride film on the back side of the silicon wafer 3;
[0063] (2) Print the first back silver paste on the silicon wafer 3 plated with a silicon nitride passivation film;
[0064] (3) Dry the first back silver paste at 200°C after printing (the back silver effect after drying is as follows: figure 2 shown);
[0065] (4) The silicon wafer is then rotated 90°, and the second type of back silver paste is printed;
[0066] (5) The second type of back silver paste is dried again at 200°C after printing (the back silver effect after drying is as follows: image 3 shown);
[0067] (6) Place the dried silicon wafer in a sintering furnace for sintering, the initial sintering temperature is 400°C, the temperature is raised to ...
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