Production process of basic copper chloride
A production process, copper chloride technology, applied in the direction of copper chloride, copper halide, etc., can solve the problems of surface roughness, reduce the quality of basic copper chloride, etc., and achieve the effect of improving quality
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Embodiment 1
[0020] This embodiment provides a technical solution: a basic copper chloride production process, the area of the anode is larger than the area of the cathode, when the area of the anode is twice that of the anode, there will be some nodules on the surface of the coating, and as the electroplating time increases, the nodules will Gradually increasing, causing the layout surface is not smooth, there are burrs.
[0021] Solution: While reducing the area of the anode, electrolyze the plating solution for one hour with a small current, and clean the anode at the same time to ensure that there is no copper powder in the upper tank.
Embodiment 2
[0023] This embodiment provides a technical solution: a basic copper chloride production process. The anode copper plate is made of rolled red copper plate. If an electrolytic copper plate is used, the dissolution rate of the anode will be accelerated, resulting in more copper powder and rough coating.
Embodiment 3
[0025] This embodiment provides a technical solution: a production process of basic copper chloride, which removes the small powder produced in the electroplating process in time.
[0026] In the normal electroplating process, some very fine powders will be produced. If these powders are not removed in time, they will be adsorbed on the surface of the cathode with the current, causing burrs to appear on the coating.
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