Unlock instant, AI-driven research and patent intelligence for your innovation.

Single photon avalanche diode image sensor pixel device and preparation method thereof

An image sensor and single-photon avalanche technology, which is applied in the field of diodes, can solve the problems of electronic crosstalk between adjacent pixel devices and limited device size, and achieve the effects of reducing electronic crosstalk, reducing size, and reducing noise

Pending Publication Date: 2021-12-28
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, the single photon avalanche diode in the related art has the problem of limited device size and electronic crosstalk between adjacent pixel devices.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Single photon avalanche diode image sensor pixel device and preparation method thereof
  • Single photon avalanche diode image sensor pixel device and preparation method thereof
  • Single photon avalanche diode image sensor pixel device and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0030] figure 1 It schematically shows a single photon avalanche diode pixel device structure in the related art,

[0031] Such as figure 1 As shown, the single photon avalanche diode pixel device structure in the related art includes: the anode of the device formed by the P+ type substrate, the cathode of the device formed by N-well / Deep N-well / N+, and the cathode and anode of the device by P-well Isolation, shallow trench STI isolates pixels from pixel to pixel.

[0032] and figure 1 The manufactured SPAD avalanche diode image sensor pixel device has at least the following disadvantages:

[0033] First of all, since the P-well and the middle photosensitive region N-well form a PN junction, a depletion region will al...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Widthaaaaaaaaaa
Widthaaaaaaaaaa
Depthaaaaaaaaaa
Login to View More

Abstract

The invention discloses a single photon avalanche diode image sensor pixel device and a preparation method thereof, and the pixel device comprises a substrate; a first P-type silicon doped region arranged in the substrate; an N-type epitaxial layer arranged on the substrate, wherein a second P-type silicon doped region, a third P-type silicon doped region, a fourth P-type silicon doped region and an N-type silicon doped region are arranged in the N-type epitaxial region. The second P-type silicon doped region, the fourth P-type silicon doped region and the third P-type silicon doped region are sequentially arranged on the upper surface of the first P-type silicon doped region from left to right; an N-type silicon doped region is arranged on the fourth P-type silicon doped region and is used for forming a PN junction. A first isolation region is arranged between the second P-type silicon doped region and the N-type silicon doped region, and a first isolation region is arranged between the third P-type silicon doped region and the N-type silicon doped region; and second isolation regions are arranged on one side, far away from the first isolation region, of the second P-type silicon doped region and one side, far away from the first isolation region, of the third P-type silicon doped region.

Description

technical field [0001] The technical field of diodes of the present invention particularly relates to a single photon avalanche diode image sensor pixel device and a preparation method. Background technique [0002] D-ToF imaging technology, the full name is Direct Time Of Flight, that is, direct flight time. The basic principle is that the pulsed light source emits laser pulses into the scene, which is reflected on the object, and the reflected laser echo will be imaged on the optical sensor under the action of the lens. By calculating the time difference between the laser emission and the received echo, the The distance to the object can be calculated. Three-dimensional imaging in a certain field of view can be achieved by using a mechanical structure or a photosensor design with a certain resolution. D-ToF imaging technology was first proposed by Western countries and put into commercial use, playing an increasingly important role in the acquisition of 3D graphics. [...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L27/146
CPCH01L27/1463H01L27/1461H01L27/14643
Inventor 王哲刘力源尹韬田娜杨旭祁楠于双铭刘剑吴南健
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI