Multiple charged-particle beam apparatus with low crosstalk
A technology of charged particles and secondary charged particles, applied in circuits, discharge tubes, electrical components, etc., can solve the problems of imaging signal fidelity limitation, insufficient detection tools, and limited imaging resolution.
Pending Publication Date: 2022-01-04
ASML NETHERLANDS BV
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Problems solved by technology
Although multiple electron beams can be used to increase throughput, limitations in the fidelity of imaging signals received by charged particle detectors can limit the desired imaging resolution for reliable defect detection and analysis, causing inspection tools to insufficient for its intended purpose
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[0021] Reference will now be made in detail to exemplary embodiments, examples of which are illustrated in the accompanying drawings. The following description refers to the drawings, and unless otherwise indicated, the same reference numbers in different drawings refer to the same or similar elements. The implementations set forth in the following description of the exemplary embodiments are not representative of all implementations. Rather, they are merely exemplary of apparatus and methods consistent with the aspects recited in the appended claims in relation to the disclosed embodiments. For example, although some embodiments are described in the context of utilizing electron beams, the present disclosure is not so limited. Other types of charged particle beams can be applied similarly. Additionally, other imaging systems may be used, such as optical imaging, light detection, X-ray detection, and the like.
[0022] Electronic devices consist of circuits formed on silico...
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Systems and methods of enhancing imaging resolution by reducing crosstalk between detection elements of a secondary charged- particle detector in a multi-beam apparatus are disclosed. The multibeam apparatus comprises an electro-optical system for projecting a plurality of secondary charged-particle beams from a sample onto a charged-particle detector (140). The electro-optical system includes a first pre-limit aperture plate (155P) comprising a first aperture configured to block peripheral charged-particles of the plurality of secondary charged-particle beams, and a beam-limit aperture array (155) comprising a second aperture configured to trim the plurality of secondary charged-particle beams. The charged-particle detector may include a plurality of detection elements (140_1, 140_2, 140_3), wherein a detection element of the plurality of detection elements is associated with a corresponding trimmed beam of the plurality of secondary charged-particle beams.
Description
[0001] Cross References to Related Applications [0002] This application claims priority to US Application 62 / 853,677, filed May 28, 2019, and is incorporated herein by reference in its entirety. technical field [0003] Embodiments provided herein disclose a multi-beam apparatus, and more particularly, a multi-beam charged particle microscope with enhanced imaging signal fidelity using a multi-beam charged particle microscope configured to reduce crosstalk A combination of aperture arrays. Background technique [0004] During the manufacture of integrated circuits (ICs), unfinished or completed circuit components are inspected to ensure that they are manufactured as designed and free from defects. Inspection systems utilizing optical microscopy or charged particle (eg, electron) beam microscopy such as scanning electron microscopy (SEM) may be employed. As the physical size of IC components continues to shrink, defect detection accuracy and yield become more important. ...
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IPC IPC(8): H01J37/09H01J37/244H01J37/28
CPCH01J37/09H01J2237/0453H01J37/28H01J37/244H01J2237/24465H01J2237/2448H01J2237/24475H01J37/153
Inventor 任伟明胡学让席庆坡刘学东
Owner ASML NETHERLANDS BV