A continuous silicon carbon negative electrode coated dynamic CVD deposition furnace

A deposition furnace and negative electrode technology, applied in the field of CVD deposition furnace, can solve problems such as poor sealing performance, and achieve the effects of good sealing effect, improved safety, and improved sealing effect

Active Publication Date: 2022-03-08
苏州力碳新能源发展有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to solve the problem of poor sealing performance in the prior art, and propose a continuous silicon carbon negative electrode coating dynamic CVD deposition furnace

Method used

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  • A continuous silicon carbon negative electrode coated dynamic CVD deposition furnace
  • A continuous silicon carbon negative electrode coated dynamic CVD deposition furnace
  • A continuous silicon carbon negative electrode coated dynamic CVD deposition furnace

Examples

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Comparison scheme
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Embodiment 1

[0036] refer to Figure 1-2 with Figure 5-7, a continuous silicon carbon negative electrode coated dynamic CVD deposition furnace, comprising a base 1 and a furnace tube 2, a support plate 101 is fixedly connected to the base 1, and a support member 202 for supporting the furnace tube 2 is provided on the top of the support plate 101, The support plate 101 is also slidably connected with a cover body 102 matched with the furnace tube 2. The cover body 102 can be slidably connected to the support plate 101 through slide rails, etc. After the cover body 102 slides, the furnace tube 2 can be exposed, which is convenient for operation; The inner wall of the cover body 102 is supported by the cylinder body 3 through the support block 307, and the furnace tube 2 is provided with a fine hole 201, and the fine hole 201 is placed inside the cylinder body 3, so that all the discharged gas is placed in the cylinder body 3 to avoid leakage , the support plate 101 is also provided with a...

Embodiment 2

[0045] refer to figure 1 , image 3 with Figure 8 , a continuous silicon carbon negative electrode coated dynamic CVD deposition furnace, comprising a base 1 and a furnace tube 2, a support plate 101 is fixedly connected to the base 1, and a support member 202 for supporting the furnace tube 2 is provided on the top of the support plate 101, The support plate 101 is also slidably connected with a cover body 102 matched with the furnace tube 2. The cover body 102 can be slidably connected to the support plate 101 through slide rails, etc. After the cover body 102 slides, the furnace tube 2 can be exposed, which is convenient for operation; The inner wall of the cover body 102 is supported by the cylinder body 3 through the support block 307, and the furnace tube 2 is provided with a fine hole 201, and the fine hole 201 is placed inside the cylinder body 3, so that all the discharged gas is placed in the cylinder body 3 to avoid leakage , the support plate 101 is also provide...

Embodiment 3

[0050] refer to figure 1 with Figure 4 , a continuous silicon carbon negative electrode coated dynamic CVD deposition furnace, comprising a base 1 and a furnace tube 2, a support plate 101 is fixedly connected to the base 1, and a support member 202 for supporting the furnace tube 2 is provided on the top of the support plate 101, The support plate 101 is also slidably connected with the cover body 102 matched with the furnace tube 2; the inner wall of the cover body 102 supports the cylinder body 3 through the support block 307, and the furnace tube 2 is provided with a fine hole 201, and the fine hole 201 is placed in the cylinder Inside the body 3 , a feeding mechanism matched with the furnace tube 2 is also provided on the support plate 101 .

[0051] Feeding mechanism comprises feed box 5, is provided with filling pad 503 in the feed box 5, is connected with feed shaft 501 in rotation in the feed box 5, is provided with the rotating plate 502 that offsets with filling p...

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Abstract

The invention discloses a continuous silicon-carbon negative electrode-coated dynamic CVD deposition furnace, which belongs to the field of CVD deposition furnaces. A continuous silicon carbon negative electrode coated dynamic CVD deposition furnace, including a base and a furnace tube, the base is fixedly connected with a support plate, the top of the support plate is provided with a support for supporting the furnace tube, the support plate A cover that matches the furnace tube is also slidably connected to the cover; the inner wall of the cover supports a cylinder through a support block, the furnace tube is provided with fine holes, and the support plate is also provided with a furnace tube. Cooperating feeding mechanism; the cylinder body is provided with a first sealing airbag and a second sealing airbag against the furnace tube, and an exhaust fan is provided in the cover body for extracting the gas between the cylinder body and the furnace tube; The sealing flange is sealed and connected with the furnace tube; the invention can effectively carry out the sealing operation, prevent gas such as acetylene, methane and hydrogen from leaking, avoid the danger of explosion, and improve the safety degree during use.

Description

technical field [0001] The invention relates to the technical field of CVD deposition furnaces, in particular to a continuous silicon-carbon anode-coated dynamic CVD deposition furnace. Background technique [0002] The anode material is an important part of the lithium-ion battery, which directly affects the energy density, cycle life and safety performance of the battery; the silicon-carbon anode is a new type of anode material for lithium batteries, which is composed of silicon and carbon, and has a variety of reactions. Technology, CVD is one of them. As an emerging negative electrode material, its capacity is dozens of times that of the mainstream graphite negative electrode material, and it is the future direction of negative electrode material development. CVD (CVD: Chemical Vapor Deposition, a reaction technology) method is the mainstream preparation method of silicon carbon negative electrode carbon coating, but there is no mature production equipment at present. ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/54C23C16/32C23C16/458H01M4/04H01M4/1395H01M10/0525
CPCC23C16/54C23C16/4581C23C16/325H01M4/0428H01M4/1395H01M10/0525H01M2004/027Y02E60/10
Inventor 李同意汪炜李云初周翟和
Owner 苏州力碳新能源发展有限公司
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