Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Electrostatic protection method of integrated circuit

An electrostatic protection and integrated circuit technology, applied in circuits, electrical components, electric solid devices, etc., can solve the problems of functional failure of integrated circuits, easy occurrence of electrostatic damage, and inability to realize electrostatic protection design of integrated circuits, so as to prevent electrostatic damage, Guaranteed effect of reliability

Pending Publication Date: 2022-01-28
INST OF MICROELECTRONICS CHINESE ACAD OF SCI
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, these new material integrated circuits are usually very sensitive to electrostatic pulses and are prone to electrostatic damage, and these new material integrated circuits also have some limitations in the characteristics of their substrate materials, which will make the electrostatic protection design of existing integrated circuits impossible to achieve. Therefore, it is impossible to effectively protect such integrated circuits from static electricity, so that in the actual application of such integrated circuits, it is easy to cause the integrated circuit function to fail due to electrostatic damage.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Electrostatic protection method of integrated circuit
  • Electrostatic protection method of integrated circuit
  • Electrostatic protection method of integrated circuit

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] The following will clearly and completely describe the technical solutions in the embodiments of the application with reference to the drawings in the embodiments of the application. Apparently, the described embodiments are only some of the embodiments of the application, not all of them. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of this application.

[0030] In the following description, a lot of specific details are set forth in order to fully understand the application, but the application can also be implemented in other ways different from those described here, and those skilled in the art can do without violating the connotation of the application. By analogy, the present application is therefore not limited by the specific embodiments disclosed below.

[0031] Secondly, the present application is described in detail in comb...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The embodiment of the invention discloses an electrostatic protection method for an integrated circuit, and the method comprises the steps: arranging the integrated circuit on a first chip, and enabling the integrated circuit to comprise an input port; arranging an electrostatic protection circuit on a second chip, wherein the electrostatic protection circuit comprises a first input lead-out port, a second input lead-out port, a first diode, a second diode, a capacitor, an N-type field effect transistor and a ground end lead-out port; and connecting the first input lead-put port with the input port, so that the electrostatic protection circuit can be connected with the integrated circuit, and the electrostatic protection circuit can perform electrostatic protection on the integrated circuit. Moreover, the integrated circuit and the electrostatic protection circuit are arranged on different chips, thereby avoiding the electrostatic protection design on the chip where the integrated circuit is located, and solving a problem that the electrostatic protection design cannot be carried out because of the limitation of the substrate material of the chip where the integrated circuit is located. And the electrostatic protection of a novel material integrated circuit which is sensitive to static electricity can be realized.

Description

technical field [0001] The present application relates to the technical field of integrated circuits, in particular to an electrostatic protection method for integrated circuits. Background technique [0002] With the development of integrated circuit technology, more and more new material integrated circuits have been or will be launched soon. The substrate materials of these new material integrated circuits are different from those of traditional silicon-based integrated circuits. Compared with traditional silicon-based integrated circuits The circuit has more superior performance, and it has become a new generation of stars that can increase the speed of computers and reduce the power consumption of electronic equipment. [0003] However, these new material integrated circuits are usually very sensitive to electrostatic pulses and are prone to electrostatic damage, and these new material integrated circuits also have some limitations in the characteristics of their substr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/02
CPCH01L27/0255H01L27/0288H01L27/0266H01L27/0292H01L27/0296
Inventor 李晓静曾传滨高林春倪涛王娟娟李多力闫薇薇单梁李明珠罗家俊赵发展韩郑生
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products