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Photomask conveying device and exposure system

A technology of a conveying device and an exposure system, which is applied in microlithography exposure equipment, photolithographic process exposure devices, optics, etc., can solve problems such as difficulty in judging the source of particles on the surface of a photomask.

Active Publication Date: 2022-02-22
CHANGXIN MEMORY TECH INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Based on this, it is necessary to provide a photomask transfer device and an exposure system for the problem that it is difficult to judge the source of particles on the surface of the photomask in the traditional technology

Method used

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  • Photomask conveying device and exposure system
  • Photomask conveying device and exposure system
  • Photomask conveying device and exposure system

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Embodiment Construction

[0039] In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. However, the present invention can be implemented in many other ways different from those described here, and those skilled in the art can make similar improvements without departing from the connotation of the present invention, so the present invention is not limited by the specific embodiments disclosed below.

[0040] The serial numbers assigned to components in this document, such as "first", "second", etc., are only used to distinguish the described objects, and do not have any sequence or technical meaning. The "connection" and "connection" mentioned in this application all include direct and...

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Abstract

The invention relates to a photomask conveying device and an exposure system. The photomask conveying device comprises a bearing part, a light source, a light detector and a controller. The bearing part is used for bearing a photomask. The light source is used for emitting irradiation light to the photomask and forming reflected light. The light detector is used for obtaining the reflected light and generating a light detection signal. The controller is used for judging whether particles exist on the illumination surface or not according to the light detection signals. The photomask conveying device can judge whether particles exist on the surface of the photomask or not in real time according to the light detection signal. When the photomask is transferred among different components through the photomask conveying device, if particles appear on the surface of the photomask, the source component of the particles can be accurately locked. The photomask conveying device can accurately judge the source of the particulate matter on the surface of the photomask, so that the elimination time of the particulate matter source is shortened, and the manufacturing capacity of semiconductor devices is improved.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a photomask transfer device and an exposure system. Background technique [0002] In the manufacturing process of semiconductor devices such as dynamic random access memory (Dynamic Random Access Memory, DRAM), photolithography is a crucial step. In the photolithography process, the cleanliness of the photomask is an important factor to ensure the quality of photolithography. [0003] In the traditional technology, an integrated reticle inspection system (Integrated Reticle Inspection System, IRIS) is usually used to detect whether there are particles on the surface of the photomask. However, it is difficult to determine the source of the particles on the surface of the photomask if the integrated mask inspection system detects whether there are particles on the surface of the photomask. Contents of the invention [0004] Based on this, it is necessary to ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/7085G03F7/70741G03F7/20B08B5/02G03F7/70925G03F7/70916G03F1/84G03F7/70025G03F7/70525
Inventor 刘子成
Owner CHANGXIN MEMORY TECH INC
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