Method for processing auxiliary graph by adopting visual editing graph database

Abstract

The invention discloses a method for processing an auxiliary graph by adopting a visual editing graph database. The method comprises the following steps: S1, establishing a target graph database; the target graph database comprises a plurality of target graphs, and each target graph comprises a main graph and an auxiliary graph; s2, defining the size of a graph search range; s3, defining a limiting condition of graph matching; the limiting condition comprises an anchor point of the main graph and a line width size range of the auxiliary graph; s4, performing graph scanning on the whole test layout, finding out a matched graph meeting the limiting condition, marking the matched graph, and outputting the matched graph and marked layout data; and S5, determining at least one auxiliary graph according to the layout data of the matched graph.

Description

technical field [0001] The invention relates to the field of semiconductor integrated circuit manufacturing, in particular to a method for processing auxiliary graphics by using a visual editing graphics database. Background technique [0002] In the advanced semiconductor integrated circuit manufacturing process, due to the use of model-based optical proximity effect correction OPC, the original design layout becomes more complicated. In actual process manufacturing, the increasingly narrow process window (process window) has become a major challenge in the photolithography process. In order to obtain a larger process window, it is proposed to add a sub-resolution auxiliary pattern (SRAF) near the main pattern to help the main pattern to be better imaged. At the same time, a process window suitable for mass production can be obtained in production, which enhances production. stability. At present, the methods commonly used in the industry to improve the process window inc...

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Problems solved by technology

[0004] However, there are problems with this method: 1) It is necessary to manually find and record the coordinate positions of the SRAF anchor points of the series of auxiliary graphics with equal line widths inserted in the layout data, which takes a long time and is inefficient; 2) CDSEM needs to observe and verify the auxiliary graphics SRAF types and graphics, which are heavy workload, time-consuming, and low efficiency; 3) In the process of optimizing the auxiliary graphics SRAF, there are few dimensions to consider, usually only the exposure of the auxiliary graphics SRAF and the size of the process window , in the process of smaller and smaller process nodes, the results of the consideration will not be sufficiently accurate

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