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Automatic polishing solution supply device for quartz ring for semiconductor

An automatic supply and polishing liquid technology, which is applied in the direction of grinding/polishing safety devices, grinding/polishing equipment, mixers with rotating stirring devices, etc., can solve the problem of affecting polishing accuracy, reducing polishing efficiency, and affecting marble and quartz rings. Surface shape and other problems, to achieve the effect of improving polishing efficiency, improving polishing accuracy and low cost

Pending Publication Date: 2022-03-22
SHANGHAI USTRON QUARTZ GLASS CO LTD
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Problems solved by technology

[0004] The invention aims at the technical problems that the concentration of the polishing liquid in the traditional supply device is continuously reduced, thus the polishing efficiency is reduced, and the temperature rises during the polishing process, which affects the surface shape of the marble and the quartz ring, and greatly affects the polishing accuracy. Automatic supply device for polishing liquid with quartz ring

Method used

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  • Automatic polishing solution supply device for quartz ring for semiconductor
  • Automatic polishing solution supply device for quartz ring for semiconductor
  • Automatic polishing solution supply device for quartz ring for semiconductor

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Embodiment Construction

[0033] In order to make the technical means realized by the present invention, creative features, goals and effects easy to understand, the present invention will be further elaborated below in conjunction with specific drawings.

[0034] refer to Figure 1 to Figure 5 , an automatic polishing liquid supply device for quartz rings for semiconductors, including a polishing liquid bucket 1, a water level gauge 2, a filter screen 3, a temperature sensor 4, a semiconductor refrigeration block 5, thermal insulation cotton 6, a tuning fork type density meter 7, a stirring Device, vibrator 10, pure water bucket 11, stock solution bucket 12, wave pump 13, polishing liquid supply pump 14, pure water pump 15, polishing liquid regulating pump 16, polishing liquid barrel cover 17, polishing liquid return port 18, overflow port 19 . Stirring device comprises stirring motor 8, three stirrers 9.

[0035] The polishing liquid bucket cover 17 is positioned at the top of the polishing liquid ...

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Abstract

The invention belongs to the technical field of semiconductors, and particularly relates to a polishing solution supply device for a quartz ring. An automatic polishing solution supply device for a quartz ring for a semiconductor comprises a polishing solution barrel, a polishing solution barrel cover, a stirring device, a polishing solution supply water pump, a pure water barrel and a stock solution barrel, the bottom of the pure water barrel is communicated with the polishing solution barrel through a pure water pump, and the bottom of the stock solution barrel is communicated with the polishing solution barrel through a polishing solution adjusting water pump. A polishing liquid return port is formed in the polishing liquid barrel cover and is connected with a polishing liquid outlet of the polishing machine through a pipeline; a tuning fork type densimeter and a temperature sensor are installed on the polishing solution barrel cover, a semiconductor refrigeration block is installed below the polishing solution barrel, the tuning fork type densimeter is connected with a pure water pump and a polishing solution adjusting water pump, and the temperature sensor is connected with the semiconductor refrigeration block. The polishing device can automatically adjust the concentration and temperature of the polishing solution, improves the polishing efficiency and precision, and is easy to operate and convenient to use.

Description

technical field [0001] The invention belongs to the technical field of semiconductors, and in particular relates to a polishing liquid supply device for a quartz ring. Background technique [0002] With the prosperity of the semiconductor chip industry, the quartz ring for semiconductors is a key component in the entire process of semiconductor manufacturing. In particular, the technical parameters of the polished semiconductor quartz ring are extremely high. [0003] The polishing process of the quartz ring needs to place the quartz ring on the marble with polyurethane polishing skin, and the polishing liquid is transported to the polishing skin through the water pump for polishing. The traditional polishing liquid supply system is mainly a wave pump placed on the polishing surface. Stir in the liquid, and then the polishing liquid is transported through the water pump. In this method, due to the precipitation of the polishing liquid and the loss of the polishing liquid, t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B24B55/02B24B49/14B01F27/112B01F35/12B01F35/00B01D33/03B01F101/27
CPCB24B55/02B24B49/14B01D33/03Y02P70/10
Inventor 单佩顾曹鑫
Owner SHANGHAI USTRON QUARTZ GLASS CO LTD
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