Unlock instant, AI-driven research and patent intelligence for your innovation.

Micro-mirror array

A technology of micro-reflector array and reflector, which is applied in the direction of micro-lithography exposure equipment, instruments, photoplate-making process of pattern surface, etc.

Pending Publication Date: 2022-04-12
ASML NETHERLANDS BV
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these micromirror arrays cannot be effectively used for the shorter wavelengths required for light in the extreme ultraviolet spectrum (EUV), such as λ = 13.5nm

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Micro-mirror array
  • Micro-mirror array
  • Micro-mirror array

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0039] figure 1 A lithographic system comprising a radiation source SO and a lithographic apparatus LA is shown. The radiation source SO is configured to generate a beam B of EUV radiation and provide the beam B of EUV radiation to the lithographic apparatus LA. The lithographic apparatus LA comprises an illumination system IL, a support structure or mask table MT configured to support a patterning device MA, a projection system PS and a substrate table WT configured to support a substrate W.

[0040] The illumination system IL is configured to condition the EUV radiation beam B before it is incident on the patterning device MA. Furthermore, the illumination system IL may comprise a facet field mirror arrangement 10 and a facet pupil mirror arrangement 11 . The illumination system IL may comprise other mirrors in addition to or instead of the facet field mirror arrangement 10 and / or the facet pupil mirror arrangement 11 or device. For example, a micromirror array as descr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The micro-mirror array includes: a substrate; a plurality of reflectors for reflecting incident light; and for each of the plurality of mirrors, connecting the substrate to a respective post of the mirror. The micromirror array further includes, for each mirror of the plurality of mirrors, one or more electrostatic actuators connected to the substrate for applying a force to the posts to displace the posts relative to the substrate, thereby displacing the mirrors. A method of forming the micromirror array is also disclosed. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and / or an inspection apparatus.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to EP application 19192294.7, filed 19 August 2019, and EP application 19199722.0, filed 26 September 2019, which are hereby incorporated by reference in their entirety. technical field [0003] The present invention relates to a micromirror array, a programmable illuminator comprising such a micromirror array, a lithography apparatus comprising such a programmable illuminator, an inspection apparatus comprising such a programmable illuminator and a method for forming such a micromirror array. mirror array approach. Background technique [0004] A lithographic apparatus is a machine configured to apply a desired pattern to a substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus may, for example, project the pattern at the patterning device onto a layer of radiation-sensitive material (resist) provided...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G02B26/08G03F7/20
CPCG03F7/70116G02B26/085G03F7/7015B81B3/0021B81B7/0087B81B2201/042B81B2203/0136B81B2203/0163
Inventor L·R·S·哈斯普斯劳格V·罗切斯G·布兰达尼·托里A·哈尔巴赫N·潘迪S·A·戈登
Owner ASML NETHERLANDS BV