Manufacturing method of micro-nano composite structure

Abstract

The invention provides a manufacturing method of a micro-nano composite structure, which comprises the following steps: providing a first support piece, forming a shaping layer on the first support piece, and enabling the shape of the shaping layer to be variable; a separation layer is stacked on the shaping layer, and a first through hole is formed in the separation layer; a nanometer template is arranged on the separation layer in a stacked mode, the nanometer template comprises a first base layer and a plurality of nanometer columns, the nanometer template makes contact with the separation layer, and the size of the nanometer columns is smaller than that of the first through holes; a second supporting piece is arranged on the nanometer template in a stacked mode, the first supporting piece and/or the second supporting piece are/is extruded, so that at least part of the shaping layer enters the separation layer from the first through hole and makes contact with the first base layer, the nanometer columns form first grooves in the shaping layer, and a micro-nano composite structure is formed in the shaping layer; according to the manufacturing method, the micro-nano composite structure is formed through one-time extrusion, machining is easy, the difficulty coefficient is small, and the manufacturing method is suitable for being applied to industrial production.

Description

technical field [0001] The invention relates to the technical field of micro-nano composite structures, in particular to a method for manufacturing a micro-nano composite structure. Background technique [0002] The existing micro-nano composite structure processing methods are divided into four categories: photolithography, laser processing, molecular self-assembly and electron beam / ion beam etching technology. Among them, the photolithography technology adopts contact exposure, the maximum resolution is 1μm, and the processing area is the largest, so it is difficult to form nanostructure composites on the microstructure; the laser processing process is divided into two exposures, the first is to process the microstructure, and then Exposure and formation of nanostructures on microstructures requires complex processing steps, and precise control of exposure parameters is required; although molecular self-assembly can form micro-nano composite structures in one step, the pro...

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Problems solved by technology

Among them, the photolithography technology adopts contact exposure, the maximum resolution is 1μm, and the processing area is the largest, so it is difficult to form nanostructure composites on the microstructure; the laser processing process is divided into two exposures, the first is to process the microstructure, and then Exposure and formation of nanostructures on microstructures requires complex processing steps, and precise control of exposure parameters is required; although molecular self-assembly can form micro-nano composite structures in one step, the processing process is restricted by various factors, not only demanding material selection, but also It is also necessary to precisely control the conditions of molecular self-assembly, and the repeatability of the prepared microstructure is not high; electron beam / ion beam etching technology is currently the highest resolution exposure method, and the processing does not require masks, and the degree of automation is high. However, its processing speed is slow and the processing cost is high, so it is not suitable for mass production and processing.

[0003] In summary, although the above processing methods can produce micro-nano composite structures, there are problems of complex processing and high difficulty coefficients, which lead to serious restrictions on the application of micro-nano composite structures to industrial production.

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