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Ultrahigh vacuum cleavage coating device and working method thereof

A coating device and ultra-high vacuum technology, applied in the semiconductor field, can solve problems such as difficulty in maintaining a high vacuum environment for a long time, and low working efficiency of an ultra-high vacuum cleavage coating device, so as to ensure uniformity and improve work efficiency. Effect

Active Publication Date: 2022-05-13
SUZHOU EVERBRIGHT PHOTONICS CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Therefore, the technical problem to be solved by the present invention is that the working efficiency of the ultra-high vacuum cleavage coating device in the prior art is low and it is difficult to maintain a high vacuum environment for a long time, thereby providing an ultra-high vacuum cleavage coating device and its working method

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  • Ultrahigh vacuum cleavage coating device and working method thereof
  • Ultrahigh vacuum cleavage coating device and working method thereof

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Embodiment Construction

[0035] The technical solutions of the present invention will be clearly and completely described below in conjunction with the accompanying drawings. Apparently, the described embodiments are some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0036] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, ...

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Abstract

The invention discloses an ultrahigh vacuum cleavage film coating device and a working method thereof. The ultrahigh vacuum cleavage film coating device comprises a cleavage cavity, a film coating device and a control system, a cleavage platform; a semiconductor light emitting device carrier; the semiconductor light-emitting device carrier comprises a first bearing platform which is provided with first positioning grooves which are oppositely arranged in a first direction and second positioning grooves which are oppositely arranged in a second direction; the first positioning pins are respectively positioned in the first positioning grooves; the second positioning pins are respectively positioned in the second positioning grooves; the first positioning pin is suitable for moving in the first direction along the first positioning groove; the second positioning pin is suitable for moving in a second direction along the second positioning groove; the first positioning pin and the second positioning pin are suitable for limiting a plurality of vertically stacked semiconductor light-emitting devices falling from the cleavage platform to the first bearing platform. The ultrahigh vacuum cleavage coating device is high in working efficiency and can maintain a high vacuum environment for a long time.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to an ultra-high vacuum cleavage coating device and a working method thereof. Background technique [0002] High-power semiconductor lasers are widely used in the fields of pumping solid-state lasers, material processing, and laser medical treatment. Improving optical output power, lifetime, and reliability has always been the focus of research in the field of semiconductor lasers. Among them, catastrophic optical mirror damage (Catastrophic Optical Mirror Degradation , referred to as COMD) is an important factor affecting the optical output power and reliability of semiconductor lasers. COMD is a kind of catastrophic damage caused by the melting of the cavity surface after the laser cavity surface area absorbs the higher optical radiation inside the resonator, causing the temperature to exceed its melting point. In order to solve this problem, the methods adopted in the pri...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S5/028C23C14/50
CPCH01S5/0282C23C14/505
Inventor 王俊李波胡燚文郭路安廖新胜闵大勇
Owner SUZHOU EVERBRIGHT PHOTONICS CO LTD
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