Lithography machine, moving table positioning and measuring system and working method of moving table positioning and measuring system
A technology of positioning measurement and moving stage, which is applied in the direction of microlithography exposure equipment, photolithography exposure device, etc., can solve the problems of pollution particles, static electricity, etc., and achieve the effects of reducing adsorption particles, improving work efficiency, and accurate position measurement
Pending Publication Date: 2022-07-01
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology
[0005] The purpose of the present invention is to provide a lithography machine, a moving table positioning measurement system and its working method to solve the problem of static electricity and pollution particles on the surface of the plane grating of the immersion lithography machine
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[0035] The inventor found through research that, according to the grating diffraction principle, the displacement of the moving direction can be obtained by moving in the direction perpendicular to the grating lines. In order to obtain the horizontal X, Y displacement, a two-dimensional plane grating with lines in both directions is required. The plane grating is arranged relative to the detection device. The detection device can detect the interference of the +1, -1 order diffracted light in the X direction and generate a phase difference, and the +1, -1 order diffracted light in the Y direction interferes and generates a phase difference, so that the X direction can be calculated. , Y displacement. When the grating moves in the Z direction or the detection device moves in the Z direction, the detection device can detect the phase change, so that the Z displacement can be calculated. Based on a plane grating, three degrees of freedom of X, Y, and Z can be obtained. In order ...
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According to the photoetching machine, the moving table positioning measurement system and the working method thereof, the blowing and discharging device is arranged in the moving table positioning measurement system, is mounted in the reading head area on the moving table, moves along with the moving table, and is used for blowing ion gas to the surface of a plane grating to remove static electricity on the surface of the grating; particles adsorbed due to static electricity are reduced, and the cleanliness of the optical path of the grating ruler is kept; the blowing and discharging device can also clean and take away particles on the surface of the grating ruler, maintain the surface cleanliness, maintain the stable measurement precision, reduce particles adsorbed on the surface of a plane grating, maintain the cleanliness of a light path of the grating ruler, and provide more accurate position measurement for a full-stroke working scene of the motion platform. According to the movement table positioning measurement system, the movement table and the plane grating do not need to be dragged out of the photoetching machine for cleaning, the full-stroke working scene of the movement table is guaranteed, more accurate position measurement is provided, and meanwhile the working efficiency is improved.
Description
technical field [0001] The invention relates to the field of lithography equipment and systems, in particular to a lithography machine, a motion table positioning measurement system and a working method thereof. Background technique [0002] With the rapid development of integrated circuits in the direction of large-scale and high integration, the requirements for the overlay accuracy of lithography machines are also getting higher and higher. Correspondingly, the accuracy of obtaining the six-degree-of-freedom position information of the motion stage and the mask stage is also increasing. also increased. [0003] In contrast, the optical path of the grating ruler measurement system can be very small (usually a few millimeters), and its optical path has nothing to do with the measurement range, and has the characteristics of high measurement stability, simple structure, and easy miniaturization. It occupies an important place in the field of nanometer measurement. In the n...
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Login to View More IPC IPC(8): G03F7/20
CPCG03F7/70908G03F7/70941G03F7/70925
Inventor 王帅
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD