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Transfer material layer for graphene manufacturing process

A graphene layer, graphene technology, applied in graphene, analytical materials, semiconductor/solid-state device manufacturing, etc., can solve problems such as discontinuous coverage

Pending Publication Date: 2022-07-08
RGT UNIV OF MINNESOTA +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the transfer process can lead to undesired residues on the graphene surface and discontinuous coverage of the substrate on which individual graphene layers are disposed after transfer.

Method used

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  • Transfer material layer for graphene manufacturing process
  • Transfer material layer for graphene manufacturing process
  • Transfer material layer for graphene manufacturing process

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0099] Example 1: PMMA transfer of graphene

[0100]A graphene monolayer was grown on a copper substrate to obtain a graphene assembly comprising a single graphene layer disposed on the surface of the copper substrate layer. A polymethylmethacrylate (PMMA) polymer layer was spin-coated on the surface of the graphene layer, and the copper base layer was removed using the etchant ammonium persulfate. The graphene layer was then transferred to a silica substrate, and the PMMA was dissolved in a strong solvent at 40°C under agitation with a magnetic stir bar set at 500 rpm for up to 48 hours to leave the graphite disposed on the silica substrate olefin layer.

[0101] Atomic force microscopy imaging was performed to detect the surface roughness of the surface of the PMMA-transferred graphene (unfunctionalized). The results of AFM imaging of PMMA-transferred graphene (unfunctionalized) are shown in Figure 8 middle. AFM imaging measures the dimensions of the surface and can d...

example 2

[0102] Example 2: Fluoropolymer transfer of graphene

[0103] A graphene monolayer was grown on a copper substrate to obtain a graphene assembly comprising a single graphene layer disposed on the surface of the copper substrate layer. Teflon TM 1 wt% solution of AF 1600 in solvent PF5080 TM in preparation. The solution is spin-coated on the surface of the graphene layer to form Teflon TM layer of AF 1600 and the solvent evaporated. The copper base layer is removed using the etchant ferric chloride. with Teflon set on it TM The graphene layer of AF 1600 was then transferred to a silica substrate. will Teflon TM The AF 1600 layer was immersed in the fluorine solvent Novec at 40 °C under agitation using a magnetic stir bar set at 500 rpm TM 7100 in the bath for up to 48 hours. Novec TM The 7100 is replaced every 12 hours. Novec TM 7100 dissolves Teflon TM AF 1600 layer to leave the graphene layer disposed on the silica substrate.

[0104] Atomic force micr...

example 3

[0105] Example 3: Taking pyrene-CH 2 COOCH 3 Fluoropolymer transfer of functionalized graphene

[0106] A graphene monolayer was grown on a copper substrate to obtain a graphene assembly comprising a single graphene layer disposed on the surface of the copper substrate layer. Graphene layers with π-rich pyrene-CH 2 COOCH 3 (pyr-CH 2 COOCH 3 ) to be functionalized. A fluoropolymer layer was spin-coated on the surface of the graphene layer, and the copper base layer was removed using the etchant ferric chloride. The graphene layer was then transferred to a silica substrate, and the fluoropolymer was dissolved in a fluorinated solvent at 40°C under agitation with a magnetic stir bar set at 500 rpm for up to 48 hours to leave the set on the silica substrate. on the graphene layer.

[0107] Performing atomic force microscopy imaging to detect fluoropolymer-transferred graphene (with pyr-CH 2 COOCH 3 The surface roughness of the surface that is functionalized). Fluorop...

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Abstract

Embodiments herein relate to methods and systems for applying a layer of transfer material to graphene during a graphene manufacturing process. In one embodiment, a method of producing a graphene sensor element is included. The method includes forming a graphene layer on a growth substrate and applying a fluoropolymer coating layer on the graphene layer. The method includes removing the growth substrate and transferring the graphene layer and the fluoropolymer coating layer onto a transfer substrate, wherein the graphene layer is disposed on the transfer substrate and the fluoropolymer layer is disposed on the graphene layer. The method further includes removing the fluoropolymer coating layer. Other embodiments are also included herein.

Description

[0001] This application was filed as a PCT international patent application on November 12, 2020. The applicant is the REGENTS OF THE UNIVERSITY OF MINNESOTA, all countries are designated; the inventors are U.S. citizen Steven J. Koester, U.S. citizen Philippe Pierre Joseph Buhlmann and Su Qun, a Chinese citizen, to designate all countries. This application is also filed as a PCT International Patent Application, the applicant is Boston Scientific Scimed, Inc., a US national company, specifying all countries; the inventors are US citizen Xue Zhen, US citizen Justin Theodore Nelson, and US citizen Gregory J. Sherwood , specifying all countries. This application claims priority to US Provisional Application No. 62 / 935,941, filed on November 15, 2019, the contents of which are incorporated herein by reference in their entirety. technical field [0002] Embodiments herein relate to methods and systems for applying a layer of transfer material to graphene during a graphene fabrica...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/02
CPCH01L21/02002G01N33/0036C01B32/19C01B2204/22C09D5/008C09D9/005C09D127/12G01N27/227G01N33/0027
Inventor 史蒂芬·J·科斯特甄学菲利普·皮埃尔·约瑟夫·布尔曼苏群贾斯廷·西奥多·尼尔森格雷戈里·J·舍伍德
Owner RGT UNIV OF MINNESOTA