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Device and method for measuring nonlinear optical parameters of 4f phase coherent imaging system

A nonlinear optics and imaging system technology, applied in the field of nonlinear photonics materials and nonlinear optical information processing, can solve the problems of difficult to measure thin film materials, large spot size, difficult optical nonlinear properties, etc. Reduce the volume and realize the effect of single beam single pulse measurement

Pending Publication Date: 2022-07-15
SUZHOU MICRONANO LASER PHOTON TECH CO LTD
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Problems solved by technology

However, due to the large spot size at the Fourier plane, this measurement method is difficult to measure such as organic crystal materials or thin film materials with poor surface flatness
[0004] In general, there are more or less difficulties in measuring the optical nonlinear properties of thin film materials with poor surface optical quality or organic crystals with relatively small size using existing technologies.

Method used

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  • Device and method for measuring nonlinear optical parameters of 4f phase coherent imaging system

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Embodiment Construction

[0029] The foregoing and other technical contents, features and effects of the present invention will be clearly presented in the following detailed description of a preferred embodiment with reference to the drawings. The directional terms mentioned in the following embodiments, such as: up, down, left, right, front or rear, etc., are only referring to the directions of the drawings. Accordingly, the directional terms used are illustrative and not limiting of the present invention. Below in conjunction with accompanying drawing, the present invention is described in further detail:

[0030] like figure 1 As shown, it is a schematic diagram of a measuring device for nonlinear optical parameters based on a 4f phase coherent imaging system according to an embodiment of the present invention. After the laser output from the laser 1 is expanded and collimated by the first convex lens 2 and the second convex lens 3, it is intercepted by the aperture stop 4 to obtain a laser with ...

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Abstract

The invention discloses a device and a method for measuring nonlinear optical parameters based on a 4f phase coherent imaging system, and the device comprises a laser beam modulation system, a phase diaphragm 4f imaging system, a 4f imaging measurement system and a microscopic imaging system, and is characterized in that a 4f measurement device and the microscopic imaging system share one lens; the lens is a microscope objective. The microscopic imaging system is arranged to observe the to-be-tested sample, so that the size range of the to-be-tested sample is expanded.

Description

technical field [0001] The invention relates to the field of nonlinear photonics materials and nonlinear optical information processing, in particular to a device for measuring the optical physical parameters of nonlinear optical properties of materials. Background technique [0002] Since the advent of lasers, the field of nonlinear optics has developed rapidly. It not only revolutionized laser technology itself, but also promoted the development of science and technology such as optical information processing, optical communication, optical computing, and laser protection. Therefore, the study of nonlinear optics is particularly important. Nonlinear optics is a subject that studies the interaction between laser and matter, so it is inseparable from the support of nonlinear optical materials. Searching for optical nonlinear materials with different uses is still a basic direction of research in this field. In general, it is to use different simple and effective nonlinear ...

Claims

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Application Information

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IPC IPC(8): G01N21/84
CPCG01N21/84
Inventor 宋瑛林杨勇杨俊义周文法
Owner SUZHOU MICRONANO LASER PHOTON TECH CO LTD
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