Novel resonance enhanced photoelectric detector and manufacturing method thereof
A technology of photodetector and manufacturing method, applied in circuits, electrical components, semiconductor devices, etc., can solve the problems of high threshold current, limited function, and restrict the development of photodetectors, and achieve the effect of improving quantum efficiency and improving stability
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[0030] like Figure 1-3 As shown in the figure, a novel resonance-enhanced photodetector provided by the present invention is mainly composed of a superstructure 1, a substrate layer 2, a first distributed Bragg mirror 3, a resonant cavity layer 4, a second distributed Bragg mirror from bottom to top Bragg mirror 5, isolation layer 6, buffer epitaxial layer 7, first contact layer 8, intrinsic layer 9, intrinsic absorption layer 10, P-type doped InAlAs layer 11, second contact layer 12, second distribution Bragg mirror, isolation layer, buffer epitaxial layer, and first contact layer are formed by etching to form a first cylindrical mesa stacked on the resonant cavity layer, intrinsic layer, intrinsic absorption layer, P-type doped InAlAs layer and the second contact layer are formed by etching to form a second cylindrical table body stacked on the first contact layer, wherein the bottom area of the first cylindrical table body is smaller than the cross-sectional area of th...
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