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Novel resonance enhanced photoelectric detector and manufacturing method thereof

A technology of photodetector and manufacturing method, applied in circuits, electrical components, semiconductor devices, etc., can solve the problems of high threshold current, limited function, and restrict the development of photodetectors, and achieve the effect of improving quantum efficiency and improving stability

Pending Publication Date: 2022-07-29
LIAOCHENG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

As the power of photodetectors continues to increase, the traditional photodetectors have a high threshold current, low photoelectric conversion efficiency, and limited functions, which limit the further development of photodetectors.

Method used

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  • Novel resonance enhanced photoelectric detector and manufacturing method thereof
  • Novel resonance enhanced photoelectric detector and manufacturing method thereof
  • Novel resonance enhanced photoelectric detector and manufacturing method thereof

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Embodiment Construction

[0030] like Figure 1-3 As shown in the figure, a novel resonance-enhanced photodetector provided by the present invention is mainly composed of a superstructure 1, a substrate layer 2, a first distributed Bragg mirror 3, a resonant cavity layer 4, a second distributed Bragg mirror from bottom to top Bragg mirror 5, isolation layer 6, buffer epitaxial layer 7, first contact layer 8, intrinsic layer 9, intrinsic absorption layer 10, P-type doped InAlAs layer 11, second contact layer 12, second distribution Bragg mirror, isolation layer, buffer epitaxial layer, and first contact layer are formed by etching to form a first cylindrical mesa stacked on the resonant cavity layer, intrinsic layer, intrinsic absorption layer, P-type doped InAlAs layer and the second contact layer are formed by etching to form a second cylindrical table body stacked on the first contact layer, wherein the bottom area of ​​the first cylindrical table body is smaller than the cross-sectional area of ​​th...

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Abstract

The invention discloses a novel resonance enhancement type photoelectric detector and a manufacturing method, relates to the technical field of semiconductors, and particularly belongs to the novel resonance enhancement type photoelectric detector and the manufacturing method. The device is characterized by comprising a superstructure layer, a substrate layer, a first distributed Bragg reflector, a resonant cavity layer, a second distributed Bragg reflector, an isolation layer, a buffer epitaxial layer, a first contact layer, an intrinsic layer, an intrinsic absorption layer, a P-type doped InAlAs layer and a second contact layer. The second distributed Bragg reflector, the isolation layer, the buffer epitaxial layer and the first contact layer are etched to form a first cylindrical table body stacked on the resonant cavity layer, and the intrinsic layer, the intrinsic absorption layer and the P-type doped InAlAs layer are etched to the second contact layer to form a second cylindrical table body stacked on the first contact layer. The invention has the positive effects of improving photoelectric conversion efficiency and quantum efficiency and realizing multi-wavelength detection and sensing functions.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a novel resonance-enhanced photodetector and a manufacturing method. Background technique [0002] For a long time, various key technologies have been researched around optoelectronic systems, and the realization of photodetectors with high integration, high performance, multi-function, low power consumption, and low cost has become a major new challenge. [0003] Traditional photodetectors have always been at the level of low power and can only achieve traditional functions, which greatly restricts the application of such devices. It was not until the development of detector material growth and preparation technology in recent years that the power level began to be obtained. Significant improvement, thus opening up broad prospects for the application and development of photodetectors. With the continuous improvement of photodetector power, the high threshold current of t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/0232H01L31/0352H01L31/101H01L31/105H01L31/18
CPCH01L31/02327H01L31/035281H01L31/1013H01L31/105H01L31/1844Y02P70/50
Inventor 范鑫烨毕丽平房文敬牛慧娟白成林张霞杨立山
Owner LIAOCHENG UNIV