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Detection device of super quick process

A detection device, a technology for ultrafast processes, applied in devices for measuring time intervals, transmittance measurement, scattering characteristic measurement, etc., can solve problems such as the inability to measure the excitation process in detail

Inactive Publication Date: 2005-01-26
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the pulse widths of the pump light and the probe light are the same in the prior art, the probe light can only measure a time-resolvable reflectance (or transmittance) within the time interval when the pump light irradiates the material. ), the excitation process cannot be measured in detail

Method used

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  • Detection device of super quick process
  • Detection device of super quick process
  • Detection device of super quick process

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Experimental program
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Embodiment Construction

[0043] see first figure 1 and figure 2 . figure 1 is a schematic diagram of the relative delay time of pump light-probe light. The time is t, probe light pulse 01, pump light pulse 02 in the prior art, and pump light pulse 03 in the device of the present invention. In the prior art, the pulse width of the pump light and the probe light are the same, and the excitation process of the material cannot be carefully measured. It can be seen from the figure that the pump light pulse 03 of the present invention is several times that of the probe light pulse 01 . We can also use dispersive elements to expand the pulse width of the pump light to several tens of times, or even hundreds of times the pulse width of the probe light.

[0044] figure 2It is a structural schematic diagram of the best embodiment of the ultrafast process detection device of the present invention. Its structure is as follows: the femtosecond laser pulse light source 1 is divided into a beam of transmitte...

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Abstract

The structure and the relation of position in the device are as follows. The light source passing through the first beam splitter mirror is divided into the transmissive pump light and the reflected probe light. With passing through the pulse strecher and the first delay light path system, the pump light is reflected by the first holophote and through the first convergent lens to irradiate the specimen to be measured perpendicularly. With passing through the second and third holophote, the probe light is focused by the second convergent lens to the specimen. The first detector is positioned in the reflected light path of the probe light and the second detector in the transmission light path. The pulse width of the pump light is broadened by the stretcher to several, tens or hundreds times of wide of the probe light pulse.

Description

Technical field: [0001] The invention relates to the ultrafast process measurement of materials, which is a detection device for the ultrafast process under the action of ultrashort pulse laser, and is mainly suitable for measuring bulk materials such as semiconductors and transparent media and nanostructure materials under the action of ultrashort pulse laser. Ultrafast processes, especially for measuring excitation processes. Background technique: [0002] Pump-probe devices are widely used to measure ultrafast processes in semiconductor bulk materials under femtosecond and picosecond laser irradiation. Since the mid-1990s, pump-probe devices have been used again to measure ultrafast processes in transparent dielectric bulk materials and nanostructured materials. It mainly studies the ultrafast nonlinear optical response of materials and explores the excitation and relaxation mechanisms of electrons and lattices in materials by measuring the reflectivity, transmittance an...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/55G01N21/59G04F13/02
Inventor 贾天卿徐至展段作梁杨晓东林礼煌汪河洲
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI